Projects per year
Fingerprint Dive into the research topics where ADRIEN NELIS is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
- 3 Similar Profiles
Network
Recent external collaboration on country level. Dive into details by clicking on the dots.
Projects
Ion implantation
Terwagne, G., BODART, F., LUCAS, S., Colaux, J., DEMARCHE, J., Genard, G., NELIS, A. & Debarsy, P.
1/09/84 → …
Project: Research
Fabrication de capteurs photovoltaïques à base de silicium et de germanium nanostructurés
Terwagne, G., Barba, D., NELIS, A. & Debarsy, P.
1/09/15 → 31/08/17
Project: Research
Research Output
- 1 Article
Blocking germanium diffusion inside silicon dioxide using a co-implanted silicon barrier
Barba, D., Wang, C., Nélis, A., Terwagne, G. & Rosei, F., 28 Apr 2018, In : Journal of Applied Physics. 123, 16, 6 p., 161540.Research output: Contribution to journal › Article
Activities
Ion Beam Analysis 2019
Guy Terwagne (Contributor), , Guy Terwagne (Member of Organizing Committee), , Adrien Nelis (Contributor), & Julien Colaux (Participant)
13 Oct 2019 → 18 Oct 2019
Activity: Participating in or organising an event types › Participation in conference
IBAF 2018
Adrien Nelis (Contributor), , Guy Terwagne (Contributor), , Paul-Louis Debarsy (Contributor), & Julien Colaux (Contributor)
27 Sep 2018
Activity: Participating in or organising an event types › Participation in conference
Ion Beam Analysis 2017
Guy Terwagne (Contributor), & Adrien Nelis (Poster)
9 Oct 2017 → 13 Oct 2017
Activity: Participating in or organising an event types › Participation in conference
Ion Beam Analysis Francophone
Adrien Nelis (Contributor)
26 Sep 2016 → 30 Sep 2016
Activity: Participating in or organising an event types › Participation in conference
formation datafurnace
Paul-Louis Debarsy (Participant), & Adrien Nelis (Participant)
2 Sep 2015 → 4 Sep 2015
Activity: Participating in or organising an event types › Participation in workshop, seminar, course
Thesis
Caractérisation de la diffusion de 74Ge+, co-implanté avec un excès de 28Si+ dans une couche de dioxyde de silicium sur un substrat de silicium
Author: Nelis, A., Sep 2014Supervisor: Terwagne, G. (Jury)
Student thesis: Master types › Master in Physics