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ADRIEN NELIS

https://orcid.org/0000-0002-7862-4433

Belgium

Source: Scopus
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Caractérisation de la diffusion de ⁷⁴Ge⁺, co-implanté avec un excès de ²⁸Si⁺ dans une couche de dioxyde de silicium sur un substrat de silicium
Author: Nelis, A., Sep 2014
Supervisor: Terwagne, G. (Jury)
Student thesis: Master types › Master in Physics

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