Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

Résultats de recherche: Contribution à un journal/une revueArticleRevue par des pairs

Résumé

High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.
langue originaleAnglais
Pages (de - à)125-138
Nombre de pages14
journalApplied Physics A, Materials Science and Processing
Volume99
Numéro de publication1
Les DOIs
Etat de la publicationPublié - 1 avr. 2010

Empreinte digitale Examiner les sujets de recherche de « Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO<sub>2</sub> deposited by magnetron sputtering ». Ensemble, ils forment une empreinte digitale unique.

Contient cette citation