Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

S. Lucas; J.-F. Colomer; P. Moskovkin; N. Moreau; C. Bittencourt

doi:10.1007/s00339-010-5566-7

Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering

S. Lucas, J.-F. Colomer, P. Moskovkin, N. Moreau, C. Bittencourt

Namur Research Institute for Life Sciences

Résultats de recherche: Contribution à un journal/une revue › Article › Revue par des pairs

Résumé

High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

langue originale	Anglais
Pages (de - à)	125-138
Nombre de pages	14
journal	Applied Physics A, Materials Science and Processing
Volume	99
Numéro de publication	1
Les DOIs	https://doi.org/10.1007/s00339-010-5566-7
Etat de la publication	Publié - 1 avr. 2010

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10.1007/s00339-010-5566-7

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title = "Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering",

abstract = "High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). {\textcopyright} Springer-Verlag 2010.",

author = "S. Lucas and J.-F. Colomer and P. Moskovkin and N. Moreau and C. Bittencourt",

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doi = "10.1007/s00339-010-5566-7",

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Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering. / Lucas, S.; Colomer, J.-F.; Moskovkin, P. et al.

Dans: Applied Physics A, Materials Science and Processing, Vol 99, Numéro 1, 01.04.2010, p. 125-138.

Résultats de recherche: Contribution à un journal/une revue › Article › Revue par des pairs

TY - JOUR

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AU - Lucas, S.

AU - Colomer, J.-F.

AU - Moskovkin, P.

AU - Moreau, N.

AU - Bittencourt, C.

PY - 2010/4/1

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AB - High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

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Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

Résumé

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Plateforme Technologique Calcul Intensif

Contient cette citation

Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering