Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

S. Lucas; J.-F. Colomer; P. Moskovkin; N. Moreau; C. Bittencourt

doi:10.1007/s00339-010-5566-7

Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering

S. Lucas, J.-F. Colomer, P. Moskovkin, N. Moreau, C. Bittencourt

Namur Research Institute for Life Sciences

Research output: Contribution to journal › Article › peer-review

Abstract

High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

Original language	English
Pages (from-to)	125-138
Number of pages	14
Journal	Applied Physics A, Materials Science and Processing
Volume	99
Issue number	1
DOIs	https://doi.org/10.1007/s00339-010-5566-7
Publication status	Published - 1 Apr 2010

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10.1007/s00339-010-5566-7

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abstract = "High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). {\textcopyright} Springer-Verlag 2010.",

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N2 - High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

AB - High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

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Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering

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Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

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Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering