High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.
|Number of pages||14|
|Journal||Applied Physics A, Materials Science and Processing|
|Publication status||Published - 1 Apr 2010|
Lucas, S., Colomer, J-F., Moskovkin, P., Moreau, N., & Bittencourt, C. (2010). Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering. Applied Physics A, Materials Science and Processing, 99(1), 125-138. https://doi.org/10.1007/s00339-010-5566-7