Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

S. Lucas; J.-F. Colomer; P. Moskovkin; N. Moreau; C. Bittencourt

doi:10.1007/s00339-010-5566-7

Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering

S. Lucas, J.-F. Colomer, P. Moskovkin, N. Moreau, C. Bittencourt

Namur Research Institute for Life Sciences

Research output: Contribution to journal › Article › peer-review

Abstract

High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

Original language	English
Pages (from-to)	125-138
Number of pages	14
Journal	Applied Physics A, Materials Science and Processing
Volume	99
Issue number	1
DOIs	https://doi.org/10.1007/s00339-010-5566-7
Publication status	Published - 1 Apr 2010

Access to Document

10.1007/s00339-010-5566-7

Cite this

@article{6d61df3ce3a4403b9b4df40598f5fd30,

title = "Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering",

abstract = "High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). {\textcopyright} Springer-Verlag 2010.",

author = "S. Lucas and J.-F. Colomer and P. Moskovkin and N. Moreau and C. Bittencourt",

year = "2010",

month = apr,

day = "1",

doi = "10.1007/s00339-010-5566-7",

language = "English",

volume = "99",

pages = "125--138",

journal = "Applied Physics A, Materials Science and Processing",

issn = "0947-8396",

publisher = "Springer Heidelberg",

number = "1",

}

TY - JOUR

T1 - Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

AU - Lucas, S.

AU - Colomer, J.-F.

AU - Moskovkin, P.

AU - Moreau, N.

AU - Bittencourt, C.

PY - 2010/4/1

Y1 - 2010/4/1

N2 - High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

AB - High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC). © Springer-Verlag 2010.

UR - http://www.scopus.com/inward/record.url?scp=77953544699&partnerID=8YFLogxK

U2 - 10.1007/s00339-010-5566-7

DO - 10.1007/s00339-010-5566-7

M3 - Article

SN - 0947-8396

VL - 99

SP - 125

EP - 138

JO - Applied Physics A, Materials Science and Processing

JF - Applied Physics A, Materials Science and Processing

IS - 1

ER -

Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering

Abstract

Access to Document

Other files and links

Fingerprint

Electron Microscopy

High Performance Computing Technology Platform

Synthesis, Irradiation and Analysis of Materials (SIAM)

Cite this

Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputtering

Abstract

Access to Document

Other files and links

Fingerprint

Equipment

Electron Microscopy

High Performance Computing Technology Platform

Synthesis, Irradiation and Analysis of Materials (SIAM)

Cite this

Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO₂ deposited by magnetron sputtering