Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass

David Barba, R.S. Cai, Julien Demarche, Y.Q. Wang, Guy Terwagne, F. Rosei, François Martin, Guy G. Ross

Research output: Contribution to journal › Article › peer-review

Cite this

@article{a75db91c74ec4347a5d9f61b71abd4aa,

title = "Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass",

author = "David Barba and R.S. Cai and Julien Demarche and Y.Q. Wang and Guy Terwagne and F. Rosei and Fran{\c c}ois Martin and Ross, {Guy G.}",

year = "2014",

month = mar,

day = "17",

language = "English",

volume = "104",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "111901",

}

TY - JOUR

T1 - Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass

AU - Barba, David

AU - Cai, R.S.

AU - Demarche, Julien

AU - Wang, Y.Q.

AU - Terwagne, Guy

AU - Rosei, F.

AU - Martin, François

AU - Ross, Guy G.

PY - 2014/3/17

Y1 - 2014/3/17

M3 - Article

SN - 0003-6951

VL - 104

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 111901

ER -