| Original language | English |
|---|---|
| Journal | Applied Physics Letters |
| Volume | 104 |
| Issue number | 111901 |
| Publication status | Accepted/In press - 17 Mar 2014 |
Cite this
Barba, D., Cai, R. S., Demarche, J., Wang, Y. Q., Terwagne, G., Rosei, F., ... Ross, G. G. (Accepted/In press). Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass. Applied Physics Letters, 104(111901).
@article{a75db91c74ec4347a5d9f61b71abd4aa,
title = "Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass",
author = "David Barba and R.S. Cai and Julien Demarche and Y.Q. Wang and Guy Terwagne and F. Rosei and Fran{\cc}ois Martin and Ross, {Guy G.}",
year = "2014",
month = "3",
day = "17",
language = "English",
volume = "104",
journal = "Appl. Phys. Lett.",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "111901",
}
Barba, D, Cai, RS, Demarche, J, Wang, YQ, Terwagne, G, Rosei, F, Martin, F & Ross, GG 2014, 'Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass', Applied Physics Letters, vol. 104, no. 111901.
Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass. / Barba, David; Cai, R.S.; Demarche, Julien; Wang, Y.Q.; Terwagne, Guy; Rosei, F.; Martin, François; Ross, Guy G.
In: Applied Physics Letters, Vol. 104, No. 111901, 17.03.2014.Research output: Contribution to journal › Article
TY - JOUR
T1 - Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass
AU - Barba, David
AU - Cai, R.S.
AU - Demarche, Julien
AU - Wang, Y.Q.
AU - Terwagne, Guy
AU - Rosei, F.
AU - Martin, François
AU - Ross, Guy G.
PY - 2014/3/17
Y1 - 2014/3/17
M3 - Article
VL - 104
JO - Appl. Phys. Lett.
JF - Appl. Phys. Lett.
SN - 0003-6951
IS - 111901
ER -
Barba D, Cai RS, Demarche J, Wang YQ, Terwagne G, Rosei F et al. Influence of silicon dangling bonds on germanium thermal diffusion within SiO2 glass. Applied Physics Letters. 2014 Mar 17;104(111901).