Research output per year
Research output per year
Equipments Details
Description
DESCRIPTION
The SIAM platform enables applied and fundamental research in material sciences. It is active both in the synthesis and the characterization of materials.
The research conducted at SIAM has direct applications in various fields such as photovoltaic, intelligent coatings, nanomaterials, public health, biomedical applications...
EXPERTISE
SIAM expertise in materials characterization relies on its capability of combining various spectroscopies (XPS, ToF- SIMS & IBA) for offering a global picture of any kind of sample: metals, welds, glass, polymers, powders, liquids, in vivo biological material...
In addition, SIAM has several facilities for functionalising materials and/or synthesising thin films by plasma treatments.
EQUIPMENT & CAPABILITIES
Analysis
Tandetron Linear Accelerator (ALTAÏS ) - Characterization
• IBA non-destructive and quantitative elemental depth profiles. Including H quantitation. Typical depth 10nm to 1μm
XPS and ToF-SIMS
• Chemical and molecular composition at surfaces
• Chemical mapping (2D) and profiling (3D)
• Depth profiling of polymers
Synthesis and irradiation
Tandetron Linear Accelerator (ALTAÏS ) - Irradiation
• Radiobiology station (cells irradiation)
• Implantation station
Vacuum deposition chambers
• Plasma sputtering
• Plasma functionalisation
The SIAM platform enables applied and fundamental research in material sciences. It is active both in the synthesis and the characterization of materials.
The research conducted at SIAM has direct applications in various fields such as photovoltaic, intelligent coatings, nanomaterials, public health, biomedical applications...
EXPERTISE
SIAM expertise in materials characterization relies on its capability of combining various spectroscopies (XPS, ToF- SIMS & IBA) for offering a global picture of any kind of sample: metals, welds, glass, polymers, powders, liquids, in vivo biological material...
In addition, SIAM has several facilities for functionalising materials and/or synthesising thin films by plasma treatments.
EQUIPMENT & CAPABILITIES
Analysis
Tandetron Linear Accelerator (ALTAÏS ) - Characterization
• IBA non-destructive and quantitative elemental depth profiles. Including H quantitation. Typical depth 10nm to 1μm
XPS and ToF-SIMS
• Chemical and molecular composition at surfaces
• Chemical mapping (2D) and profiling (3D)
• Depth profiling of polymers
Synthesis and irradiation
Tandetron Linear Accelerator (ALTAÏS ) - Irradiation
• Radiobiology station (cells irradiation)
• Implantation station
Vacuum deposition chambers
• Plasma sputtering
• Plasma functionalisation
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Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.
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Influence of oxygen co-implantation on germanium out-diffusion and nanoclustering in SiO2/Si films
Nelis, A., Haye, E. & Terwagne, G., 9 Feb 2022, In: Thin Solid Films. 746, 139135, 139135.Research output: Contribution to journal › Article › peer-review
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Taking Advantage of the Senescence-Promoting Effect of Olaparib after X-ray and Proton Irradiation Using the Senolytic Drug, ABT-263
Huart, C., Fransolet, M., Demazy, C., Le Calvé, B., Lucas, S., Michiels, C. & Wéra, A. C., 2022, In: Cancers. 14, 6, 1460.Research output: Contribution to journal › Article › peer-review
Open AccessFile6 Downloads (Pure) -
CVD growth of self-assembled 2D and 1D WS2 nanomaterials for the ultrasensitive detection of NO2
Alagh, A., Annanouch, F. E., Umek, P., Bittencourt, C., Sierra-Castillo, A., Haye, E., Colomer, J. F. & Llobet, E., 1 Jan 2021, In: Sensors and Actuators B: Chemical . 326, 128813.Research output: Contribution to journal › Article › peer-review
Activities
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Chromium nitridedeposition onto silicon pyramids for supercapacitor applications
Emile Haye (Speaker), Abdelouadoud GUERRA (Speaker), Amine Achour (Speaker), Jean-Jacques Pireaux (Speaker) & Stephane Lucas (Speaker)
9 Sep 2020Activity: Talk or presentation types › Oral presentation
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Glancing angle deposition of CrN film for supercapacitor application.
Emile Haye (Speaker), Amine Achour (Speaker), Abdelouadoud GUERRA (Speaker), Fatsah MOULAI (Speaker), Toufik HADJERSI (Speaker), Rabah Boukherroub (Speaker), Adriano PANEPINTO (Speaker), Thierry BROUSSE (Speaker), Jean-Jacques Pireaux (Speaker) & Stéphane Lucas (Speaker)
May 2019Activity: Talk or presentation types › Oral presentation