Fundamental properties of photovoltaic cells produced by plasma assisted deposition and ion implantation

We will study the fundamental properties of third generation photovoltaic cells (PV). Ion implantation of silicon into silicon oxide modifies considerably the optical and electrical properties of the material. It has been shown recently that photoluminescence of such implanted coating is enhanced. The electrical properties are also modified. Ion implantation is particularly promising for increasing the yield of PV cells of the third generation.