Effective attenuation length of AlKa excited Si2p photoelectron in SiO2, Al2O3 and HfO2 thin films

Roumen Vitchev, Ch. Defranoux, J. Wolstenholme, Thierry Conard, H. Bender, Jean-Jacques Pireaux

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)37-44
Number of pages8
JournalJournal of Electronic Spectroscopy and Related Phenomena
Issue number12
Publication statusPublished - 2005

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