Effective attenuation length of AlKa excited Si2p photoelectron in SiO₂, Al₂O₃ and HfO₂ thin films

Roumen Vitchev, Ch. Defranoux, J. Wolstenholme, Thierry Conard, H. Bender, Jean-Jacques Pireaux

Namur Research Institute for Life Sciences

Research output: Contribution to journal › Article

1 results
- Title(descending)

Synthesis, Irradiation and Analysis of Materials (SIAM)
Pierre Louette (Manager), Julien Colaux (Manager), Alexandre Felten (Manager), Tijani Tabarrant (Operator), Frederic COME (Operator) & Paul-Louis Debarsy (Manager)
Technological Platform Synthesis, Irradiation and Analysis of Materials
Facility/equipment: Technological Platform