ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO₂/Al₂O₃oxides

Ingénierie et Science des Matériaux

• Depth profiling 100%
• Secondary ion mass spectrometry 91%
• Chemical analysis 39%
• Metals 26%
• X ray photoelectron spectroscopy 24%
• Thin films 19%
• Oxides 17%
• Substrates 14%

Physique & Astronomie

• secondary ion mass spectrometry 62%
• metals 20%
• ions 18%
• depletion 17%
• cycles 13%
• oxides 12%
• augmentation 12%
• thin films 10%
• energy 5%

composés chimiques

• Depth Profiling 76%
• Molecular Cluster 26%
• Metal 18%
• Ion 16%
• Surface 12%
• Oxide 10%
• Energy 9%