Silicon nanocrystal synthesis by implantation of natural Si isotopes

David Barba, Dimitri Koshel, François Martin, Guy G. Ross, Martin Chicoine, François Schiettekatte, Mourad Yedji, Julien Demarche, Guy Terwagne

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    Implantations of pure , , and into SiO2 can provide significant insight into the formation of silicon nanocrystals (Si-nc) and their light emission properties. Si-nc produced with different fractions of the heavier Si isotopes have been characterized by Raman and photoluminescence spectroscopy. Weak Stokes shifts of the Si-nc phonon peaks indicate that both the implanted Si and the native Si from the SiO2 substrate contribute to Si-nc nucleation. The Raman measurements also indicate that the Si isotopic composition of the Si-nc is similar to the Si isotopic fraction of the implanted SiO2. The Si-nc photoluminescence (PL) spectra are shifted towards the blue with increasing Si isotope mass, an indication that the increase of the Si-nc effective mass enhances the excitonic bandgap. Measurements from samples implanted with heavy isotopes at high Si excess concentrations indicate that the Si-nc isotope fraction evolves with annealing time such that the heaviest Si isotope are more concentrated in the vicinity of the Si-nc/SiO2 interface, which can modify the energy states involved in the radiative transitions associated with Si-nc.
    langue originaleAnglais
    Pages (de - à)669-673
    Nombre de pages5
    journalJournal of Luminescence
    Etat de la publicationPublié - 2009

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