Direct observation of conductive filament formation in Alq3 based organic resistive memories

Y. Busby, S. Nau, S. Sax, E. J W List-Kratochvil, J. Novak, R. Banerjee, F. Schreiber, J. J. Pireaux

Résultats de recherche: Contribution à un journal/une revueArticle

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Résumé

This work explores resistive switching mechanisms in non-volatile organic memory devices based on tris(8-hydroxyquinolie)aluminum (Alq<inf>3</inf>). Advanced characterization tools are applied to investigate metal diffusion in ITO/Alq<inf>3</inf>/Ag memory device stacks leading to conductive filament formation. The morphology of Alq<inf>3</inf>/Ag layers as a function of the metal evaporation conditions is studied by X-ray reflectivity, while depth profile analysis with X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry is applied to characterize operational memory elements displaying reliable bistable current-voltage characteristics. 3D images of the distribution of silver inside the organic layer clearly point towards the existence of conductive filaments and allow for the identification of the initial filament formation and inactivation mechanisms during switching of the device. Initial filament formation is suggested to be driven by field assisted diffusion of silver from abundant structures formed during the top electrode evaporation, whereas thermochemical effects lead to local filament inactivation.

langue originaleAnglais
Numéro d'article075501
journalJournal of Applied Physics
Volume118
Numéro de publication7
Les DOIs
étatPublié - 21 août 2015

Empreinte digitale

filaments
deactivation
silver
evaporation
ITO (semiconductors)
metals
secondary ion mass spectrometry
x rays
photoelectron spectroscopy
aluminum
reflectance
electrodes
electric potential
profiles

Citer ceci

Busby, Y. ; Nau, S. ; Sax, S. ; List-Kratochvil, E. J W ; Novak, J. ; Banerjee, R. ; Schreiber, F. ; Pireaux, J. J. / Direct observation of conductive filament formation in Alq3 based organic resistive memories. Dans: Journal of Applied Physics. 2015 ; Vol 118, Numéro 7.
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abstract = "This work explores resistive switching mechanisms in non-volatile organic memory devices based on tris(8-hydroxyquinolie)aluminum (Alq3). Advanced characterization tools are applied to investigate metal diffusion in ITO/Alq3/Ag memory device stacks leading to conductive filament formation. The morphology of Alq3/Ag layers as a function of the metal evaporation conditions is studied by X-ray reflectivity, while depth profile analysis with X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry is applied to characterize operational memory elements displaying reliable bistable current-voltage characteristics. 3D images of the distribution of silver inside the organic layer clearly point towards the existence of conductive filaments and allow for the identification of the initial filament formation and inactivation mechanisms during switching of the device. Initial filament formation is suggested to be driven by field assisted diffusion of silver from abundant structures formed during the top electrode evaporation, whereas thermochemical effects lead to local filament inactivation.",
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Busby, Y, Nau, S, Sax, S, List-Kratochvil, EJW, Novak, J, Banerjee, R, Schreiber, F & Pireaux, JJ 2015, 'Direct observation of conductive filament formation in Alq3 based organic resistive memories', Journal of Applied Physics, VOL. 118, Numéro 7, 075501. https://doi.org/10.1063/1.4928622

Direct observation of conductive filament formation in Alq3 based organic resistive memories. / Busby, Y.; Nau, S.; Sax, S.; List-Kratochvil, E. J W; Novak, J.; Banerjee, R.; Schreiber, F.; Pireaux, J. J.

Dans: Journal of Applied Physics, Vol 118, Numéro 7, 075501, 21.08.2015.

Résultats de recherche: Contribution à un journal/une revueArticle

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AU - Nau, S.

AU - Sax, S.

AU - List-Kratochvil, E. J W

AU - Novak, J.

AU - Banerjee, R.

AU - Schreiber, F.

AU - Pireaux, J. J.

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