Surface characterization of a low dielectric constant polymer-SiLK* polymer, and investigation of its interface with Cu

Aparna Rajagopal; Chantal Grégoire; Jean-Jacques Lemaire; Jean-Jacques Pireaux; Mikhail Baklanov; Serge Vanhaelemeersch; Karen Maex; Joost Waeterloos

Surface characterization of a low dielectric constant polymer-SiLK* polymer, and investigation of its interface with Cu

Aparna Rajagopal, Chantal Grégoire, Jean-Jacques Lemaire, Jean-Jacques Pireaux, Mikhail Baklanov, Serge Vanhaelemeersch, Karen Maex, Joost Waeterloos

Namur Research Institute for Life Sciences

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	2336-2340
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and nanometer structures processing, measurement and phenomena
Volume	17
Issue number	5
Publication status	Published - 1999

Cite this

Rajagopal, A., Grégoire, C., Lemaire, J.-J., Pireaux, J.-J., Baklanov, M., Vanhaelemeersch, S., Maex, K., & Waeterloos, J. (1999). Surface characterization of a low dielectric constant polymer-SiLK* polymer, and investigation of its interface with Cu. Journal of Vacuum Science and Technology B: Microelectronics and nanometer structures processing, measurement and phenomena, 17(5), 2336-2340.

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title = "Surface characterization of a low dielectric constant polymer-SiLK* polymer, and investigation of its interface with Cu",

author = "Aparna Rajagopal and Chantal Gr{\'e}goire and Jean-Jacques Lemaire and Jean-Jacques Pireaux and Mikhail Baklanov and Serge Vanhaelemeersch and Karen Maex and Joost Waeterloos",

note = "Publication code : **RES. ACAD.",

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language = "English",

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Rajagopal, A, Grégoire, C, Lemaire, J-J, Pireaux, J-J, Baklanov, M, Vanhaelemeersch, S, Maex, K & Waeterloos, J 1999, 'Surface characterization of a low dielectric constant polymer-SiLK* polymer, and investigation of its interface with Cu', Journal of Vacuum Science and Technology B: Microelectronics and nanometer structures processing, measurement and phenomena, vol. 17, no. 5, pp. 2336-2340.

Surface characterization of a low dielectric constant polymer-SiLK* polymer, and investigation of its interface with Cu. / Rajagopal, Aparna; Grégoire, Chantal; Lemaire, Jean-Jacques et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and nanometer structures processing, measurement and phenomena, Vol. 17, No. 5, 1999, p. 2336-2340.

Research output: Contribution to journal › Article

TY - JOUR

T1 - Surface characterization of a low dielectric constant polymer-SiLK* polymer, and investigation of its interface with Cu

AU - Rajagopal, Aparna

AU - Grégoire, Chantal

AU - Lemaire, Jean-Jacques

AU - Pireaux, Jean-Jacques

AU - Baklanov, Mikhail

AU - Vanhaelemeersch, Serge

AU - Maex, Karen

AU - Waeterloos, Joost

N1 - Publication code : **RES. ACAD.

PY - 1999

Y1 - 1999

M3 - Article

SN - 1071-1023

VL - 17

SP - 2336

EP - 2340

JO - Journal of Vacuum Science and Technology B: Microelectronics and nanometer structures processing, measurement and phenomena

JF - Journal of Vacuum Science and Technology B: Microelectronics and nanometer structures processing, measurement and phenomena

IS - 5

ER -