Study of Fe/Si multilayers by photoemission spectroscopy

Bronislaw Orlowski, Bogdan Kowalski, Krzysztof Fronc, R Zuberek, Sigismund Mickievicius, Frédéric Mirabella, Jacques Ghijsen

Research output: Contribution to journalArticle


The Fe/Si multilayers structure was grown by direct current magnetron sputtering technique and was studied by means of X-ray photoelectron spectroscopy. The iron silicide formation at the oxidized Fe/Si interface is inhibited at room and elevated temperatures and it occurs at T500 °C. The prolonged annealing of the Fe/Si interface to 500 °C leads to the steady growth of the Si3+ and Si4+ oxygen-related components in the sample.
Original languageEnglish
Pages (from-to)202-205
Number of pages4
JournalJournal of alloys and Compounds
Publication statusPublished - 2004


  • X-Ray photoelectron spectroscopy; Iron; Silicides; Silicon oxides; Fe?x2013;Si interface


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