Study of Fe/Si multilayers by photoemission spectroscopy

Bronislaw Orlowski; Bogdan Kowalski; Krzysztof Fronc; R Zuberek; Sigismund Mickievicius; Frédéric Mirabella; Jacques Ghijsen

Study of Fe/Si multilayers by photoemission spectroscopy

Bronislaw Orlowski, Bogdan Kowalski, Krzysztof Fronc, R Zuberek, Sigismund Mickievicius, Frédéric Mirabella, Jacques Ghijsen

Namur Research Institute for Life Sciences

Résultats de recherche: Contribution à un journal/une revue › Article

Résumé

The Fe/Si multilayers structure was grown by direct current magnetron sputtering technique and was studied by means of X-ray photoelectron spectroscopy. The iron silicide formation at the oxidized Fe/Si interface is inhibited at room and elevated temperatures and it occurs at T500 °C. The prolonged annealing of the Fe/Si interface to 500 °C leads to the steady growth of the Si3+ and Si4+ oxygen-related components in the sample.

langue originale	Anglais
Pages (de - à)	202-205
Nombre de pages	4
journal	Journal of alloys and Compounds
Volume	362
Etat de la publication	Publié - 2004

Contient cette citation

@article{82208405e4434b13817d42aa843d1714,

title = "Study of Fe/Si multilayers by photoemission spectroscopy",

abstract = "The Fe/Si multilayers structure was grown by direct current magnetron sputtering technique and was studied by means of X-ray photoelectron spectroscopy. The iron silicide formation at the oxidized Fe/Si interface is inhibited at room and elevated temperatures and it occurs at T500 °C. The prolonged annealing of the Fe/Si interface to 500 °C leads to the steady growth of the Si3+ and Si4+ oxygen-related components in the sample. ",

keywords = "X-Ray photoelectron spectroscopy; Iron; Silicides; Silicon oxides; Fe?x2013;Si interface",

author = "Bronislaw Orlowski and Bogdan Kowalski and Krzysztof Fronc and R Zuberek and Sigismund Mickievicius and Fr{\'e}d{\'e}ric Mirabella and Jacques Ghijsen",

year = "2004",

language = "English",

volume = "362",

pages = "202--205",

journal = "Journal of alloys and Compounds",

publisher = "Elsevier",

}

TY - JOUR

T1 - Study of Fe/Si multilayers by photoemission spectroscopy

AU - Orlowski, Bronislaw

AU - Kowalski, Bogdan

AU - Fronc, Krzysztof

AU - Zuberek, R

AU - Mickievicius, Sigismund

AU - Mirabella, Frédéric

AU - Ghijsen, Jacques

PY - 2004

Y1 - 2004

N2 - The Fe/Si multilayers structure was grown by direct current magnetron sputtering technique and was studied by means of X-ray photoelectron spectroscopy. The iron silicide formation at the oxidized Fe/Si interface is inhibited at room and elevated temperatures and it occurs at T500 °C. The prolonged annealing of the Fe/Si interface to 500 °C leads to the steady growth of the Si3+ and Si4+ oxygen-related components in the sample.

AB - The Fe/Si multilayers structure was grown by direct current magnetron sputtering technique and was studied by means of X-ray photoelectron spectroscopy. The iron silicide formation at the oxidized Fe/Si interface is inhibited at room and elevated temperatures and it occurs at T500 °C. The prolonged annealing of the Fe/Si interface to 500 °C leads to the steady growth of the Si3+ and Si4+ oxygen-related components in the sample.

KW - X-Ray photoelectron spectroscopy; Iron; Silicides; Silicon oxides; Fe?x2013;Si interface

M3 - Article

VL - 362

SP - 202

EP - 205

JO - Journal of alloys and Compounds

JF - Journal of alloys and Compounds

ER -

Study of Fe/Si multilayers by photoemission spectroscopy

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