Study of Fe/Si multilayers by photoemission spectroscopy

Bronislaw Orlowski, Bogdan Kowalski, Krzysztof Fronc, R Zuberek, Sigismund Mickievicius, Frédéric Mirabella, Jacques Ghijsen

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Résumé

The Fe/Si multilayers structure was grown by direct current magnetron sputtering technique and was studied by means of X-ray photoelectron spectroscopy. The iron silicide formation at the oxidized Fe/Si interface is inhibited at room and elevated temperatures and it occurs at T500 °C. The prolonged annealing of the Fe/Si interface to 500 °C leads to the steady growth of the Si3+ and Si4+ oxygen-related components in the sample.
langue originaleAnglais
Pages (de - à)202-205
Nombre de pages4
journalJournal of alloys and Compounds
Volume362
Etat de la publicationPublié - 2004

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