Ion-induced densification of PVD films - a choice of the optimum density of ion bombardement

G.I. Grigorov; K.G. Grigorov; Robert Sporken; Roland Caudano

doi:10.1007/BF01567334

Ion-induced densification of PVD films - a choice of the optimum density of ion bombardement

G.I. Grigorov, K.G. Grigorov, Robert Sporken, Roland Caudano

Research output: Contribution to journal › Article › peer-review

Abstract

The densification process by ion-assisted physical vapour deposition of films is considered as a consequence of rearrangement of atoms in the near-surface film layer. A model is proposed allowing the quantitative estimate of the optimum ion current density required to produce a film with maximum density.

Original language	English
Pages (from-to)	399-401
Journal	Applied physics. A: Materials science and processing
Volume	63
DOIs	https://doi.org/10.1007/BF01567334
Publication status	Published - 1996

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title = "Ion-induced densification of PVD films - a choice of the optimum density of ion bombardement",

abstract = "The densification process by ion-assisted physical vapour deposition of films is considered as a consequence of rearrangement of atoms in the near-surface film layer. A model is proposed allowing the quantitative estimate of the optimum ion current density required to produce a film with maximum density.",

author = "G.I. Grigorov and K.G. Grigorov and Robert Sporken and Roland Caudano",

year = "1996",

doi = "10.1007/BF01567334",

language = "English",

volume = "63",

pages = "399--401",

journal = "Applied physics. A: Materials science and processing",

issn = "0947-8396",

publisher = "Springer Heidelberg",

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T1 - Ion-induced densification of PVD films - a choice of the optimum density of ion bombardement

AU - Grigorov, G.I.

AU - Grigorov, K.G.

AU - Sporken, Robert

AU - Caudano, Roland

PY - 1996

Y1 - 1996

N2 - The densification process by ion-assisted physical vapour deposition of films is considered as a consequence of rearrangement of atoms in the near-surface film layer. A model is proposed allowing the quantitative estimate of the optimum ion current density required to produce a film with maximum density.

AB - The densification process by ion-assisted physical vapour deposition of films is considered as a consequence of rearrangement of atoms in the near-surface film layer. A model is proposed allowing the quantitative estimate of the optimum ion current density required to produce a film with maximum density.

U2 - 10.1007/BF01567334

DO - 10.1007/BF01567334

M3 - Article

SN - 0947-8396

VL - 63

SP - 399

EP - 401

JO - Applied physics. A: Materials science and processing

JF - Applied physics. A: Materials science and processing

ER -

Ion-induced densification of PVD films - a choice of the optimum density of ion bombardement

Abstract

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