Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

J.M. Chappé, N. Martin, J.F. Pierson, Guy Terwagne, J. Lintymer, J. Gavoille, J. Takadoum

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@article{bcf76b2e194b44b9abc128041d5c1164,

title = "Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering",

author = "J.M. Chapp{\'e} and N. Martin and J.F. Pierson and Guy Terwagne and J. Lintymer and J. Gavoille and J. Takadoum",

note = "Publication code : **RES. ACAD.",

year = "2004",

language = "English",

volume = "225",

pages = "29--38",

journal = "Applied Surface Science",

publisher = "Elsevier",

}

TY - JOUR

T1 - Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

AU - Chappé, J.M.

AU - Martin, N.

AU - Pierson, J.F.

AU - Terwagne, Guy

AU - Lintymer, J.

AU - Gavoille, J.

AU - Takadoum, J.

N1 - Publication code : **RES. ACAD.

PY - 2004

Y1 - 2004

M3 - Article

VL - 225

SP - 29

EP - 38

JO - Applied Surface Science

JF - Applied Surface Science

ER -