Characterization of silicon nitride thin films deposited by plasma magnetron

Abdelkrim Batan, Alexis Franquet, Jean Vereecken, François Reniers

Research output: Working paper

Original languageEnglish
Publication statusUnpublished - 2008

Cite this

Batan, Abdelkrim ; Franquet, Alexis ; Vereecken, Jean ; Reniers, François. / Characterization of silicon nitride thin films deposited by plasma magnetron. 2008.
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Characterization of silicon nitride thin films deposited by plasma magnetron. / Batan, Abdelkrim; Franquet, Alexis; Vereecken, Jean; Reniers, François.

2008.

Research output: Working paper

TY - UNPB

T1 - Characterization of silicon nitride thin films deposited by plasma magnetron

AU - Batan, Abdelkrim

AU - Franquet, Alexis

AU - Vereecken, Jean

AU - Reniers, François

PY - 2008

Y1 - 2008

M3 - Working paper

BT - Characterization of silicon nitride thin films deposited by plasma magnetron

ER -