Fourth International Conference on Microelectronics and Interfaces (ICMI'03)

Houssiau, L. (Contributor)

Activity: Participating in or organising an event typesParticipation in conference

Description

Multitechnique Characterisation of Al2O3 Thin Layers Deposited on SiO2/Si surface by Atomic Layer Chemical Vapour Deposition, communivation orale. Co-au
Period3 Mar 20036 Mar 2003
Event typeConference
LocationSanta Clara CA, Etats-Unis