Metallic source/drain architecture: status and prospects

Emmanuel Dubois, G. Larrieu, N. Breil, R. Valentin, F. Danneville, M Ostling, P E Hellstrom, Nicolas Reckinger, Xiaohui Tang, Jean-Pierre Raskin, Q T Zhao, S Mantl

Research output: Contribution to conferenceAbstract

Scientific committee

Scientific committeeSINANO Workshop Nanoscale CMOS and beyond CMOS nanodevices
CountryGermany
CityMunich
Period14/09/07 → …

Cite this

Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Ostling, M., ... Mantl, S. (2007). Metallic source/drain architecture: status and prospects. Abstract from SINANO Workshop Nanoscale CMOS and beyond CMOS nanodevices, Munich, Germany.
Dubois, Emmanuel ; Larrieu, G. ; Breil, N. ; Valentin, R. ; Danneville, F. ; Ostling, M ; Hellstrom, P E ; Reckinger, Nicolas ; Tang, Xiaohui ; Raskin, Jean-Pierre ; Zhao, Q T ; Mantl, S. / Metallic source/drain architecture: status and prospects. Abstract from SINANO Workshop Nanoscale CMOS and beyond CMOS nanodevices, Munich, Germany.
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title = "Metallic source/drain architecture: status and prospects",
author = "Emmanuel Dubois and G. Larrieu and N. Breil and R. Valentin and F. Danneville and M Ostling and Hellstrom, {P E} and Nicolas Reckinger and Xiaohui Tang and Jean-Pierre Raskin and Zhao, {Q T} and S Mantl",
year = "2007",
language = "English",
note = "SINANO Workshop Nanoscale CMOS and beyond CMOS nanodevices ; Conference date: 14-09-2007",

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Dubois, E, Larrieu, G, Breil, N, Valentin, R, Danneville, F, Ostling, M, Hellstrom, PE, Reckinger, N, Tang, X, Raskin, J-P, Zhao, QT & Mantl, S 2007, 'Metallic source/drain architecture: status and prospects' SINANO Workshop Nanoscale CMOS and beyond CMOS nanodevices, Munich, Germany, 14/09/07, .

Metallic source/drain architecture: status and prospects. / Dubois, Emmanuel; Larrieu, G.; Breil, N.; Valentin, R.; Danneville, F.; Ostling, M; Hellstrom, P E; Reckinger, Nicolas; Tang, Xiaohui; Raskin, Jean-Pierre ; Zhao, Q T; Mantl, S.

2007. Abstract from SINANO Workshop Nanoscale CMOS and beyond CMOS nanodevices, Munich, Germany.

Research output: Contribution to conferenceAbstract

TY - CONF

T1 - Metallic source/drain architecture: status and prospects

AU - Dubois,Emmanuel

AU - Larrieu,G.

AU - Breil,N.

AU - Valentin,R.

AU - Danneville,F.

AU - Ostling,M

AU - Hellstrom,P E

AU - Reckinger,Nicolas

AU - Tang,Xiaohui

AU - Raskin,Jean-Pierre

AU - Zhao,Q T

AU - Mantl,S

PY - 2007

Y1 - 2007

M3 - Abstract

ER -

Dubois E, Larrieu G, Breil N, Valentin R, Danneville F, Ostling M et al. Metallic source/drain architecture: status and prospects. 2007. Abstract from SINANO Workshop Nanoscale CMOS and beyond CMOS nanodevices, Munich, Germany.