Activity: Participating in or organising an event types › Participation in conference
Description
<Characterization of ultrathin high-k HfO2 layers grown on silicon-influence of the deposition parameters and interfacial layer> ; L. Houssiau, R.G. Vitchev, J.J. Pireaux, T. Conard and H. Bender
<RF Plasma functionalization of carbon nanotubes surface