16th International Vacuum congress (IVC-16)

Activity: Participating in or organising an event typesParticipation in conference


<Characterization of ultrathin high-k HfO2 layers grown on silicon-influence of the deposition parameters and interfacial layer> ; L. Houssiau, R.G. Vitchev, J.J. Pireaux, T. Conard and H. Bender <RF Plasma functionalization of carbon nanotubes surface
Period28 Jun 20042 Jul 2004
Event typeConference
LocationVenise, ItalieShow on map