Résumé
While most of the works devoted to the synthesis of transition metal nitride coating by magnetron sputtering use N2 as reactive gas, an alternative method is proposed, namely using ammonia (NH3) as reactive gas. The magnetron sputtering of chromium in Ar/NH3 atmosphere is studied and compared to Ar/N2 atmosphere, with in situ (hysteresis curve, target voltage measurement, optical emission spectroscopy, deposition rate) and ex situ characterizations (XPS, XRD, SEM, RBS, UV–Vis, nanoindentation, 4-points probe). It appears that ammonia as a reactive gas influences the optical, electrical and mechanical properties as well as the microstructure of the thin films in a very similar way to HiPIMS with N2 reactive gas; improved mechanical properties are obtained, attributed to a change of the morphology, from columnar-like to nanocrystalline.
| langue originale | Anglais |
|---|---|
| Numéro d'article | 144176 |
| journal | Applied Surface Science |
| Volume | 502 |
| Les DOIs | |
| état | Publié - 1 févr. 2020 |
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Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS? / Rassinfosse, Louis; Colaux, Julien L.; Pilloud, David; Nominé, Alexandre; Tumanov, Nikolay; Lucas, Stéphane; Pireaux, Jean Jacques; Haye, Emile.
Dans: Applied Surface Science, Vol 502, 144176, 01.02.2020.Résultats de recherche: Contribution à un journal/une revue › Article
TY - JOUR
T1 - Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?
AU - Rassinfosse, Louis
AU - Colaux, Julien L.
AU - Pilloud, David
AU - Nominé, Alexandre
AU - Tumanov, Nikolay
AU - Lucas, Stéphane
AU - Pireaux, Jean Jacques
AU - Haye, Emile
PY - 2020/2/1
Y1 - 2020/2/1
N2 - While most of the works devoted to the synthesis of transition metal nitride coating by magnetron sputtering use N2 as reactive gas, an alternative method is proposed, namely using ammonia (NH3) as reactive gas. The magnetron sputtering of chromium in Ar/NH3 atmosphere is studied and compared to Ar/N2 atmosphere, with in situ (hysteresis curve, target voltage measurement, optical emission spectroscopy, deposition rate) and ex situ characterizations (XPS, XRD, SEM, RBS, UV–Vis, nanoindentation, 4-points probe). It appears that ammonia as a reactive gas influences the optical, electrical and mechanical properties as well as the microstructure of the thin films in a very similar way to HiPIMS with N2 reactive gas; improved mechanical properties are obtained, attributed to a change of the morphology, from columnar-like to nanocrystalline.
AB - While most of the works devoted to the synthesis of transition metal nitride coating by magnetron sputtering use N2 as reactive gas, an alternative method is proposed, namely using ammonia (NH3) as reactive gas. The magnetron sputtering of chromium in Ar/NH3 atmosphere is studied and compared to Ar/N2 atmosphere, with in situ (hysteresis curve, target voltage measurement, optical emission spectroscopy, deposition rate) and ex situ characterizations (XPS, XRD, SEM, RBS, UV–Vis, nanoindentation, 4-points probe). It appears that ammonia as a reactive gas influences the optical, electrical and mechanical properties as well as the microstructure of the thin films in a very similar way to HiPIMS with N2 reactive gas; improved mechanical properties are obtained, attributed to a change of the morphology, from columnar-like to nanocrystalline.
KW - Ammonia
KW - Chromium nitride
KW - Reactive magnetron sputtering
UR - http://www.scopus.com/inward/record.url?scp=85074371182&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2019.144176
DO - 10.1016/j.apsusc.2019.144176
M3 - Article
AN - SCOPUS:85074371182
VL - 502
JO - Appl. Surface Science
JF - Appl. Surface Science
SN - 0169-4332
M1 - 144176
ER -