Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?

Louis Rassinfosse, Julien L. Colaux, David Pilloud, Alexandre Nominé, Nikolay Tumanov, Stéphane Lucas, Jean Jacques Pireaux, Emile Haye

Résultats de recherche: Contribution à un journal/une revueArticle

Résumé

While most of the works devoted to the synthesis of transition metal nitride coating by magnetron sputtering use N2 as reactive gas, an alternative method is proposed, namely using ammonia (NH3) as reactive gas. The magnetron sputtering of chromium in Ar/NH3 atmosphere is studied and compared to Ar/N2 atmosphere, with in situ (hysteresis curve, target voltage measurement, optical emission spectroscopy, deposition rate) and ex situ characterizations (XPS, XRD, SEM, RBS, UV–Vis, nanoindentation, 4-points probe). It appears that ammonia as a reactive gas influences the optical, electrical and mechanical properties as well as the microstructure of the thin films in a very similar way to HiPIMS with N2 reactive gas; improved mechanical properties are obtained, attributed to a change of the morphology, from columnar-like to nanocrystalline.

langue originaleAnglais
Numéro d'article144176
journalApplied Surface Science
Volume502
Les DOIs
étatPublié - 1 févr. 2020

Empreinte digitale

Reactive sputtering
Ammonia
Magnetron sputtering
ammonia
magnetron sputtering
Gases
gases
mechanical properties
metal nitrides
atmospheres
Mechanical properties
Optical emission spectroscopy
Voltage measurement
optical emission spectroscopy
Chromium
Nanoindentation
nanoindentation
Deposition rates
Nitrides
electrical measurement

Citer ceci

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title = "Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?",
abstract = "While most of the works devoted to the synthesis of transition metal nitride coating by magnetron sputtering use N2 as reactive gas, an alternative method is proposed, namely using ammonia (NH3) as reactive gas. The magnetron sputtering of chromium in Ar/NH3 atmosphere is studied and compared to Ar/N2 atmosphere, with in situ (hysteresis curve, target voltage measurement, optical emission spectroscopy, deposition rate) and ex situ characterizations (XPS, XRD, SEM, RBS, UV–Vis, nanoindentation, 4-points probe). It appears that ammonia as a reactive gas influences the optical, electrical and mechanical properties as well as the microstructure of the thin films in a very similar way to HiPIMS with N2 reactive gas; improved mechanical properties are obtained, attributed to a change of the morphology, from columnar-like to nanocrystalline.",
keywords = "Ammonia, Chromium nitride, Reactive magnetron sputtering",
author = "Louis Rassinfosse and Colaux, {Julien L.} and David Pilloud and Alexandre Nomin{\'e} and Nikolay Tumanov and St{\'e}phane Lucas and Pireaux, {Jean Jacques} and Emile Haye",
year = "2020",
month = "2",
day = "1",
doi = "10.1016/j.apsusc.2019.144176",
language = "English",
volume = "502",
journal = "Appl. Surface Science",
issn = "0169-4332",
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Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS? / Rassinfosse, Louis; Colaux, Julien L.; Pilloud, David; Nominé, Alexandre; Tumanov, Nikolay; Lucas, Stéphane; Pireaux, Jean Jacques; Haye, Emile.

Dans: Applied Surface Science, Vol 502, 144176, 01.02.2020.

Résultats de recherche: Contribution à un journal/une revueArticle

TY - JOUR

T1 - Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?

AU - Rassinfosse, Louis

AU - Colaux, Julien L.

AU - Pilloud, David

AU - Nominé, Alexandre

AU - Tumanov, Nikolay

AU - Lucas, Stéphane

AU - Pireaux, Jean Jacques

AU - Haye, Emile

PY - 2020/2/1

Y1 - 2020/2/1

N2 - While most of the works devoted to the synthesis of transition metal nitride coating by magnetron sputtering use N2 as reactive gas, an alternative method is proposed, namely using ammonia (NH3) as reactive gas. The magnetron sputtering of chromium in Ar/NH3 atmosphere is studied and compared to Ar/N2 atmosphere, with in situ (hysteresis curve, target voltage measurement, optical emission spectroscopy, deposition rate) and ex situ characterizations (XPS, XRD, SEM, RBS, UV–Vis, nanoindentation, 4-points probe). It appears that ammonia as a reactive gas influences the optical, electrical and mechanical properties as well as the microstructure of the thin films in a very similar way to HiPIMS with N2 reactive gas; improved mechanical properties are obtained, attributed to a change of the morphology, from columnar-like to nanocrystalline.

AB - While most of the works devoted to the synthesis of transition metal nitride coating by magnetron sputtering use N2 as reactive gas, an alternative method is proposed, namely using ammonia (NH3) as reactive gas. The magnetron sputtering of chromium in Ar/NH3 atmosphere is studied and compared to Ar/N2 atmosphere, with in situ (hysteresis curve, target voltage measurement, optical emission spectroscopy, deposition rate) and ex situ characterizations (XPS, XRD, SEM, RBS, UV–Vis, nanoindentation, 4-points probe). It appears that ammonia as a reactive gas influences the optical, electrical and mechanical properties as well as the microstructure of the thin films in a very similar way to HiPIMS with N2 reactive gas; improved mechanical properties are obtained, attributed to a change of the morphology, from columnar-like to nanocrystalline.

KW - Ammonia

KW - Chromium nitride

KW - Reactive magnetron sputtering

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DO - 10.1016/j.apsusc.2019.144176

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