Unbalanced magnetron sputtered Si-Al coatings: plasma conditions and film properties versus sample bias voltage

Marco Jacobs, Guy Terwagne, Philippe Roquiny, Franz Bodart

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langue originale	Anglais
Pages (de - à)	735-741
Nombre de pages	7
journal	Surface and Coatings Technology
Volume	116-119
Etat de la publication	Publié - 1999

Accès au document

@article{ac5edd1e3c534f0eb0e440cc984ae6bb,

title = "Unbalanced magnetron sputtered Si-Al coatings: plasma conditions and film properties versus sample bias voltage",

author = "Marco Jacobs and Guy Terwagne and Philippe Roquiny and Franz Bodart",

note = "Publication code : **RES. ACAD.",

year = "1999",

language = "English",

volume = "116-119",

pages = "735--741",

journal = "Surface and Coatings Technology",

publisher = "Elsevier",

}

TY - JOUR

T1 - Unbalanced magnetron sputtered Si-Al coatings

T2 - plasma conditions and film properties versus sample bias voltage

AU - Jacobs, Marco

AU - Terwagne, Guy

AU - Roquiny, Philippe

AU - Bodart, Franz

N1 - Publication code : **RES. ACAD.

PY - 1999

Y1 - 1999

M3 - Article

VL - 116-119

SP - 735

EP - 741

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -