In this paper, we present results of transmission electron microscopy studies on erbium silicide structures fabricated under various thermal conditions. A titanium cap has been used as a protective layer against oxidation during rapid thermal annealing of an erbium layer in a temperature range of 300-700°C. Both layers (200 nm Ti and 25 nm Er) were deposited by electron-beam sputtering. The investigations have shown that the transformation of the 25-nm-thick erbium into erbium silicide is completed after annealing at 500°C. At higher temperatures, the formation of a titanium silicide layer above erbium silicide is observed. The lowest Schottky barrier has been measured in the sample annealed at 700°C.
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Ratajczak, J., Laszcz, A., Czerwinski, A., Ka̧tcki, J., Phillipp, F., Van Aken, P. A., Reckinger, N., & Dubois, E. (2010). Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications. Journal of Microscopy, 237(3), 379-383. https://doi.org/10.1111/j.1365-2818.2009.03264.x