TY - JOUR
T1 - TOF-SIMS study of organosilane adsorption on model hydroxyl terminated surfaces
AU - Houssiau, L.
AU - Bertrand, Patrick
PY - 2003/1/15
Y1 - 2003/1/15
N2 - In order to further understand organosilane oscillatory adsorption, we have adsorbed octyltrichlorosilane (CHSiCl or OS) on model hydroxyl terminated surfaces consisting of a thiol-alcohol self-assembled on gold. The adsorption kinetics was followed with the time-of-flight secondary ion mass spectrometry (TOF-SIMS) technique. The OS adsorption is readily detected by means of a variety of silicon containing ions, some non-specific (e.g. SiH, SiO) and others specific of the OS (CHSiO or dimers CHSiO). Interestingly, a complex non-monotonic adsorption pattern is observed. Moreover, carefully selected ions exhibit different intensity variations with the adsorption time, providing some insight not only on adsorption kinetics, but also on film cross-linking, adsorption sites occupation and even on HCl production due to the trichlorosilane hydrolysis. Small, non-specific fragments (SiH) are believed to indicate the OS surface coverage whereas large specific fragments are strongly dependent on the interface cross-linking, which reduces their probability of sputtering.
AB - In order to further understand organosilane oscillatory adsorption, we have adsorbed octyltrichlorosilane (CHSiCl or OS) on model hydroxyl terminated surfaces consisting of a thiol-alcohol self-assembled on gold. The adsorption kinetics was followed with the time-of-flight secondary ion mass spectrometry (TOF-SIMS) technique. The OS adsorption is readily detected by means of a variety of silicon containing ions, some non-specific (e.g. SiH, SiO) and others specific of the OS (CHSiO or dimers CHSiO). Interestingly, a complex non-monotonic adsorption pattern is observed. Moreover, carefully selected ions exhibit different intensity variations with the adsorption time, providing some insight not only on adsorption kinetics, but also on film cross-linking, adsorption sites occupation and even on HCl production due to the trichlorosilane hydrolysis. Small, non-specific fragments (SiH) are believed to indicate the OS surface coverage whereas large specific fragments are strongly dependent on the interface cross-linking, which reduces their probability of sputtering.
UR - http://www.scopus.com/inward/record.url?scp=0037438231&partnerID=8YFLogxK
U2 - 10.1016/S0169-4332(02)00770-5
DO - 10.1016/S0169-4332(02)00770-5
M3 - Article
AN - SCOPUS:0037438231
SN - 0169-4332
VL - 203-204
SP - 580
EP - 585
JO - Applied Surface Science
JF - Applied Surface Science
ER -