TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn+, C60+ and Cs+ sputtering ions: A comparative study

N. Wehbe, T. Tabarrant, J. Brison, T. Mouhib, A. Delcorte, P. Bertrand, R. Moellers, E. Niehuis, L. Houssiau

Résultats de recherche: Contribution à un journal/une revueArticle

Résumé

The performance of Cs, C and Ar (with n ≈ 1700) sputtering ions have been compared for depth profiling multilayer films made from three evaporated phenylalanine layers sandwiched between four thicker evaporated tyrosine layers. Using Cs , the ion signals and depth resolution degrade with depth and were significantly affected beyond a 200-nm depth. The depth profiling quality was more successful using C. However, in this case, the depth resolution and the layer width values still degrade with the sputtered depth and are particularly poor after reaching a depth of about 400 nm. When Ar clusters were used, a depth resolution as low as 6 nm was obtained, and this value never exceeds 9 nm. Moreover, the experimental layer width is found to be of the same order of magnitude as the real value.
langue originaleAnglais
Pages (de - à)178-180
Nombre de pages3
journalSurface and interface analysis
Volume45
Numéro de publication1
Les DOIs
étatPublié - 1 janv. 2013

Empreinte digitale

Depth profiling
Argon
Secondary ion mass spectrometry
secondary ion mass spectrometry
Sputtering
amino acids
Amino acids
Multilayers
sputtering
argon
Ions
Amino Acids
Multilayer films
Phenylalanine
Tyrosine
ions
phenylalanine
tyrosine

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@article{7ca27ee474274c07aa20ef6c6b9f6a80,
title = "TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn+, C60+ and Cs+ sputtering ions: A comparative study",
abstract = "The performance of Cs, C and Ar (with n ≈ 1700) sputtering ions have been compared for depth profiling multilayer films made from three evaporated phenylalanine layers sandwiched between four thicker evaporated tyrosine layers. Using Cs , the ion signals and depth resolution degrade with depth and were significantly affected beyond a 200-nm depth. The depth profiling quality was more successful using C. However, in this case, the depth resolution and the layer width values still degrade with the sputtered depth and are particularly poor after reaching a depth of about 400 nm. When Ar clusters were used, a depth resolution as low as 6 nm was obtained, and this value never exceeds 9 nm. Moreover, the experimental layer width is found to be of the same order of magnitude as the real value.",
author = "N. Wehbe and T. Tabarrant and J. Brison and T. Mouhib and A. Delcorte and P. Bertrand and R. Moellers and E. Niehuis and L. Houssiau",
year = "2013",
month = "1",
day = "1",
doi = "10.1002/sia.5121",
language = "English",
volume = "45",
pages = "178--180",
journal = "Surface and interface analysis",
issn = "0142-2421",
publisher = "John Wiley and Sons Ltd",
number = "1",

}

TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn+, C60+ and Cs+ sputtering ions : A comparative study. / Wehbe, N.; Tabarrant, T.; Brison, J.; Mouhib, T.; Delcorte, A.; Bertrand, P.; Moellers, R.; Niehuis, E.; Houssiau, L.

Dans: Surface and interface analysis, Vol 45, Numéro 1, 01.01.2013, p. 178-180.

Résultats de recherche: Contribution à un journal/une revueArticle

TY - JOUR

T1 - TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn+, C60+ and Cs+ sputtering ions

T2 - A comparative study

AU - Wehbe, N.

AU - Tabarrant, T.

AU - Brison, J.

AU - Mouhib, T.

AU - Delcorte, A.

AU - Bertrand, P.

AU - Moellers, R.

AU - Niehuis, E.

AU - Houssiau, L.

PY - 2013/1/1

Y1 - 2013/1/1

N2 - The performance of Cs, C and Ar (with n ≈ 1700) sputtering ions have been compared for depth profiling multilayer films made from three evaporated phenylalanine layers sandwiched between four thicker evaporated tyrosine layers. Using Cs , the ion signals and depth resolution degrade with depth and were significantly affected beyond a 200-nm depth. The depth profiling quality was more successful using C. However, in this case, the depth resolution and the layer width values still degrade with the sputtered depth and are particularly poor after reaching a depth of about 400 nm. When Ar clusters were used, a depth resolution as low as 6 nm was obtained, and this value never exceeds 9 nm. Moreover, the experimental layer width is found to be of the same order of magnitude as the real value.

AB - The performance of Cs, C and Ar (with n ≈ 1700) sputtering ions have been compared for depth profiling multilayer films made from three evaporated phenylalanine layers sandwiched between four thicker evaporated tyrosine layers. Using Cs , the ion signals and depth resolution degrade with depth and were significantly affected beyond a 200-nm depth. The depth profiling quality was more successful using C. However, in this case, the depth resolution and the layer width values still degrade with the sputtered depth and are particularly poor after reaching a depth of about 400 nm. When Ar clusters were used, a depth resolution as low as 6 nm was obtained, and this value never exceeds 9 nm. Moreover, the experimental layer width is found to be of the same order of magnitude as the real value.

UR - http://www.scopus.com/inward/record.url?scp=84872847985&partnerID=8YFLogxK

U2 - 10.1002/sia.5121

DO - 10.1002/sia.5121

M3 - Article

AN - SCOPUS:84872847985

VL - 45

SP - 178

EP - 180

JO - Surface and interface analysis

JF - Surface and interface analysis

SN - 0142-2421

IS - 1

ER -