TiOx deposited by magnetron sputtering: a joint modelling and experimental study

Romain Tonneau, Pavel Moskovkin, Andreas Pflug (Promoteur), Stéphane Lucas (Promoteur)

Résultats de recherche: Contribution à un journal/une revueArticle

Résumé

This paper presents a 3D multiscale simulation approach to model magnetron reactive sputter deposition of TiOx⩽2 at various O2 inlets and its validation against experimental results. The simulation first involves the transport of sputtered material in a vacuum chamber by means of a three-dimensional direct simulation Monte Carlo (DSMC) technique. Second, the film growth at different positions on a 3D substrate is simulated using a kinetic Monte Carlo (kMC) method. When simulating the transport of species in the chamber, wall chemistry
reactions are taken into account in order to get the proper content of the reactive species in the volume. Angular and energy distributions of particles are extracted from DSMC and used for film growth modelling by kMC.
Along with the simulation, experimental deposition of TiOx coatings on silicon samples placed at different positions on a curved sample holder was performed. The experimental results are in agreement with the simulated ones. For a given coater, the plasma phase hysteresis behaviour, film composition and film morphology are predicted. The used methodology can be applied to any coater and any films. This paves the way to the elaboration of a virtual coater allowing a user to predict composition and morphology of films deposited in silico.
langue originaleAnglais
Numéro d'article195202
Nombre de pages19
journalJournal of Physics D: Applied Physics
Volume51
Numéro de publication19
Les DOIs
étatPublié - 20 avr. 2018

Empreinte digitale

Magnetron sputtering
magnetron sputtering
Film growth
simulation
Sputter deposition
Kinetics
Silicon
Chemical analysis
Hysteresis
Monte Carlo methods
kinetics
Vacuum
vacuum chambers
holders
Plasmas
Coatings
Monte Carlo method
energy distribution
Substrates
angular distribution

Citer ceci

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title = "TiOx deposited by magnetron sputtering: a joint modelling and experimental study",
abstract = "This paper presents a 3D multiscale simulation approach to model magnetron reactive sputter deposition of TiOx⩽2 at various O2 inlets and its validation against experimental results. The simulation first involves the transport of sputtered material in a vacuum chamber by means of a three-dimensional direct simulation Monte Carlo (DSMC) technique. Second, the film growth at different positions on a 3D substrate is simulated using a kinetic Monte Carlo (kMC) method. When simulating the transport of species in the chamber, wall chemistry reactions are taken into account in order to get the proper content of the reactive species in the volume. Angular and energy distributions of particles are extracted from DSMC and used for film growth modelling by kMC.Along with the simulation, experimental deposition of TiOx coatings on silicon samples placed at different positions on a curved sample holder was performed. The experimental results are in agreement with the simulated ones. For a given coater, the plasma phase hysteresis behaviour, film composition and film morphology are predicted. The used methodology can be applied to any coater and any films. This paves the way to the elaboration of a virtual coater allowing a user to predict composition and morphology of films deposited in silico.",
keywords = "plasma modelling, Monte Carlo simulation, reactive magnetron sputtering, film growth, titanium oxide, Thin film, thin film",
author = "Romain Tonneau and Pavel Moskovkin and Andreas Pflug and St{\'e}phane Lucas",
year = "2018",
month = "4",
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doi = "10.1088/1361-6463/aabb72",
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journal = "Journal of Physics D: Applied Physics",
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TiOx deposited by magnetron sputtering: a joint modelling and experimental study. / Tonneau, Romain; Moskovkin, Pavel; Pflug, Andreas (Promoteur); Lucas, Stéphane (Promoteur).

Dans: Journal of Physics D: Applied Physics, Vol 51, Numéro 19, 195202, 20.04.2018.

Résultats de recherche: Contribution à un journal/une revueArticle

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AU - Tonneau, Romain

AU - Moskovkin, Pavel

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PY - 2018/4/20

Y1 - 2018/4/20

N2 - This paper presents a 3D multiscale simulation approach to model magnetron reactive sputter deposition of TiOx⩽2 at various O2 inlets and its validation against experimental results. The simulation first involves the transport of sputtered material in a vacuum chamber by means of a three-dimensional direct simulation Monte Carlo (DSMC) technique. Second, the film growth at different positions on a 3D substrate is simulated using a kinetic Monte Carlo (kMC) method. When simulating the transport of species in the chamber, wall chemistry reactions are taken into account in order to get the proper content of the reactive species in the volume. Angular and energy distributions of particles are extracted from DSMC and used for film growth modelling by kMC.Along with the simulation, experimental deposition of TiOx coatings on silicon samples placed at different positions on a curved sample holder was performed. The experimental results are in agreement with the simulated ones. For a given coater, the plasma phase hysteresis behaviour, film composition and film morphology are predicted. The used methodology can be applied to any coater and any films. This paves the way to the elaboration of a virtual coater allowing a user to predict composition and morphology of films deposited in silico.

AB - This paper presents a 3D multiscale simulation approach to model magnetron reactive sputter deposition of TiOx⩽2 at various O2 inlets and its validation against experimental results. The simulation first involves the transport of sputtered material in a vacuum chamber by means of a three-dimensional direct simulation Monte Carlo (DSMC) technique. Second, the film growth at different positions on a 3D substrate is simulated using a kinetic Monte Carlo (kMC) method. When simulating the transport of species in the chamber, wall chemistry reactions are taken into account in order to get the proper content of the reactive species in the volume. Angular and energy distributions of particles are extracted from DSMC and used for film growth modelling by kMC.Along with the simulation, experimental deposition of TiOx coatings on silicon samples placed at different positions on a curved sample holder was performed. The experimental results are in agreement with the simulated ones. For a given coater, the plasma phase hysteresis behaviour, film composition and film morphology are predicted. The used methodology can be applied to any coater and any films. This paves the way to the elaboration of a virtual coater allowing a user to predict composition and morphology of films deposited in silico.

KW - plasma modelling

KW - Monte Carlo simulation

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