Single source precursor vs. precursor mixture for N-rich plasma polymer deposition: Plasma diagnostics and thin film analyses

Madhuwanthi Buddhadasa, Cédric Vandenabeele, Pierre Luc Girard-Lauriault, Rony Snyders

Résultats de recherche: Contribution à un journal/une revueArticle

langueAnglais
Nombre de pages14
journalPlasma Processes and Polymers
étatPublié - 15 mai 2017
Modification externeOui

Citer ceci

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title = "Single source precursor vs. precursor mixture for N-rich plasma polymer deposition: Plasma diagnostics and thin film analyses",
author = "Madhuwanthi Buddhadasa and C{\'e}dric Vandenabeele and Girard-Lauriault, {Pierre Luc} and Rony Snyders",
year = "2017",
month = "5",
day = "15",
language = "English",
journal = "Plasma Processes and Polymers",
issn = "1612-8850",
publisher = "Wiley-VCH Verlag",

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Single source precursor vs. precursor mixture for N-rich plasma polymer deposition: Plasma diagnostics and thin film analyses. / Buddhadasa, Madhuwanthi; Vandenabeele, Cédric; Girard-Lauriault, Pierre Luc; Snyders, Rony.

Dans: Plasma Processes and Polymers , 15.05.2017.

Résultats de recherche: Contribution à un journal/une revueArticle

TY - JOUR

T1 - Single source precursor vs. precursor mixture for N-rich plasma polymer deposition: Plasma diagnostics and thin film analyses

AU - Buddhadasa,Madhuwanthi

AU - Vandenabeele,Cédric

AU - Girard-Lauriault,Pierre Luc

AU - Snyders,Rony

PY - 2017/5/15

Y1 - 2017/5/15

UR - http://onlinelibrary.wiley.com/doi/10.1002/ppap.201700030/abstract

M3 - Article

JO - Plasma Processes and Polymers

T2 - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

SN - 1612-8850

ER -