Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties

Résultats de recherche: Contribution à un événement scientifique (non publié)Poster

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Résumé

In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
langue originaleAnglais
Nombre de pages1
étatNon publié - 2018
EvénementPLASMA DIAGNOSTICS AND MODELLING WORKSHOP
: TOWARDS THE INDUSTRIAL APPLICATIONS OF PLASMA-BASED PROCESSES
- Mons, Mons, Belgique
Durée: 7 févr. 20188 févr. 2018
http://www.dm2018.eu/

Colloque

ColloquePLASMA DIAGNOSTICS AND MODELLING WORKSHOP
Titre abrégéDM
PaysBelgique
La villeMons
période7/02/188/02/18
Adresse Internet

Empreinte digitale

oxide films
magnetron sputtering
optical properties
evaluation
vacuum deposition
simulation
energetic particles
projectiles
energy distribution
angular distribution
sputtering
energy transfer
oxides
kinetics
thin films
atoms
ions

Citer ceci

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title = "Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties",
abstract = "In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.",
keywords = "simulations, film growth, reactive magnetron sputtering, kinetic Monte Carlo",
author = "Romain Tonneau and Pavel Moskovkin and St{\'e}phane Lucas",
year = "2018",
language = "English",
note = "null ; Conference date: 07-02-2018 Through 08-02-2018",
url = "http://www.dm2018.eu/",

}

Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties. / Tonneau, Romain; Moskovkin, Pavel; Lucas, Stéphane (Promoteur).

2018. Poster présenté � PLASMA DIAGNOSTICS AND MODELLING WORKSHOP
, Mons, Belgique.

Résultats de recherche: Contribution à un événement scientifique (non publié)Poster

TY - CONF

T1 - Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties

AU - Tonneau, Romain

AU - Moskovkin, Pavel

A2 - Lucas, Stéphane

PY - 2018

Y1 - 2018

N2 - In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.

AB - In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions. Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.

KW - simulations

KW - film growth

KW - reactive magnetron sputtering

KW - kinetic Monte Carlo

M3 - Poster

ER -