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Résumé
In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
| langue originale | Anglais |
|---|---|
| Nombre de pages | 1 |
| Etat de la publication | Non publié - 2018 |
| Evénement | PLASMA DIAGNOSTICS AND MODELLING WORKSHOP : TOWARDS THE INDUSTRIAL APPLICATIONS OF PLASMA-BASED PROCESSES - Mons, Mons, Belgique Durée: 7 févr. 2018 → 8 févr. 2018 http://www.dm2018.eu/ |
Colloque
| Colloque | PLASMA DIAGNOSTICS AND MODELLING WORKSHOP |
|---|---|
| Titre abrégé | DM |
| Pays/Territoire | Belgique |
| La ville | Mons |
| période | 7/02/18 → 8/02/18 |
| Adresse Internet |
Empreinte digitale
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- 1 Participation à une conférence, un congrès
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11th Asian-European International Conference on Plasma Surface Engineering
Stéphane Lucas (Orateur invité)
11 sept. 2017 → 15 sept. 2017Activité: Participation ou organisation d'un événement › Participation à une conférence, un congrès