Simulations of oxide films growth deposited by magnetron sputtering and evaluation of their morphology and optical properties

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Résumé

In order to simulate the growth of oxides thin film by vacuum deposition methods, a model based on kinetic Monte Carlo (kMC) approach on a three-dimensional lattice has been developed. The model takes into account deposition of different species, metallic and reactive. Both metallic and reactive fluxes may consist of atoms as well as ions having their own energy and angular distributions.
Effects of deposition of energetic particles are also taken into account. These effects are energy transfer from the projectiles to the film, sputtering of the film as well as re-deposition.
langue originaleAnglais
Nombre de pages1
Etat de la publicationNon publié - 2018
EvénementPLASMA DIAGNOSTICS AND MODELLING WORKSHOP
: TOWARDS THE INDUSTRIAL APPLICATIONS OF PLASMA-BASED PROCESSES
- Mons, Mons, Belgique
Durée: 7 févr. 20188 févr. 2018
http://www.dm2018.eu/

Colloque

ColloquePLASMA DIAGNOSTICS AND MODELLING WORKSHOP
Titre abrégéDM
PaysBelgique
La villeMons
période7/02/188/02/18
Adresse Internet

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  • Activités

    • 1 Participation à une conférence, un congrès

    11th Asian-European International Conference on Plasma Surface Engineering

    Stéphane Lucas (Orateur invité)

    11 sept. 201715 sept. 2017

    Activité: Types de Participation ou d'organisation d'un événementParticipation à une conférence, un congrès

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