Process and apparatus for coating a substrate

Pierre Vanden Brande,; Stephane Lucas,; Alain Weymeersch,

Process and apparatus for coating a substrate

Titre traduit de la contribution: Procédé et dispositif pour la formation d'un revêtement sur un substrat

Pierre Vanden Brande, (Inventeur), Stephane Lucas, (Inventeur), Alain Weymeersch, (Inventeur)

Résultats de recherche: brevet › Brevet

Résumé

Procédé et dispositif pour la formation d'un revêtement sur un substrat (1) se déplaçant à travers une enceinte (2), ce procédé consistant à former le revêtement par une évaporation suivie d'une condensation et par une pulvérisation cathodique simultanée de cet élément à partir d'une cible (4) sur le substrat (1) et à régler le rapport des quantités de l'élément qui sont simultanément évaporées et pulvérisées en agissant sur l'apport d'énergie à la cible (4).

Titre traduit de la contribution	Procédé et dispositif pour la formation d'un revêtement sur un substrat
langue originale	Anglais
Numéro de brevet	EP0780486
CIB	C23C 14/ 56 A I
Date de priorité	20/12/95
Etat de la publication	Publié - 25 juin 1997

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EP-780486
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@misc{36d3640a451a459b80a1237469289fdf,

title = "Process and apparatus for coating a substrate",

abstract = "In forming a coating of an element, especially a metal, on a substrate moving through an evaporation chamber, the novelty is that (a) the chamber is equipped with a target which has a substrate-facing surface layer containing the element; (b) the coating is formed by vapour deposition and simultaneous cathodic sputtering of the element from the target; and (c) the ratio of the amounts of evaporated and sputtered element is regulated by the energy supply to the target. Also claimed is a coating apparatus especially for carrying out the above process, the apparatus having (i) a chamber (3) equipped with a target (4) having a surface layer (5) facing the substrate (1) and containing one or more of the elements of the coating (2); (ii) a transport system for moving the substrate (1) preferably continuously past the target (4); (iii) a heat regulating system (9) for holding the surface layer (5) optionally in the liquid state and for controlled evaporation of the element; and (iv) a system (6, 8, 10, 11) for cathodic sputtering of the element from the target (4) towards the substrate (1).",

author = "{Vanden Brande,}, Pierre and Stephane Lucas, and Alain Weymeersch,",

year = "1997",

month = jun,

day = "25",

language = "English",

type = "Patent",

note = "EP0780486; C23C 14/ 56 A I",

}

TY - PAT

T1 - Process and apparatus for coating a substrate

AU - Vanden Brande,, Pierre

AU - Lucas,, Stephane

AU - Weymeersch,, Alain

PY - 1997/6/25

Y1 - 1997/6/25

N2 - In forming a coating of an element, especially a metal, on a substrate moving through an evaporation chamber, the novelty is that (a) the chamber is equipped with a target which has a substrate-facing surface layer containing the element; (b) the coating is formed by vapour deposition and simultaneous cathodic sputtering of the element from the target; and (c) the ratio of the amounts of evaporated and sputtered element is regulated by the energy supply to the target. Also claimed is a coating apparatus especially for carrying out the above process, the apparatus having (i) a chamber (3) equipped with a target (4) having a surface layer (5) facing the substrate (1) and containing one or more of the elements of the coating (2); (ii) a transport system for moving the substrate (1) preferably continuously past the target (4); (iii) a heat regulating system (9) for holding the surface layer (5) optionally in the liquid state and for controlled evaporation of the element; and (iv) a system (6, 8, 10, 11) for cathodic sputtering of the element from the target (4) towards the substrate (1).

AB - In forming a coating of an element, especially a metal, on a substrate moving through an evaporation chamber, the novelty is that (a) the chamber is equipped with a target which has a substrate-facing surface layer containing the element; (b) the coating is formed by vapour deposition and simultaneous cathodic sputtering of the element from the target; and (c) the ratio of the amounts of evaporated and sputtered element is regulated by the energy supply to the target. Also claimed is a coating apparatus especially for carrying out the above process, the apparatus having (i) a chamber (3) equipped with a target (4) having a surface layer (5) facing the substrate (1) and containing one or more of the elements of the coating (2); (ii) a transport system for moving the substrate (1) preferably continuously past the target (4); (iii) a heat regulating system (9) for holding the surface layer (5) optionally in the liquid state and for controlled evaporation of the element; and (iv) a system (6, 8, 10, 11) for cathodic sputtering of the element from the target (4) towards the substrate (1).

M3 - Patent

M1 - EP0780486

ER -

Process and apparatus for coating a substrate

Résumé

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