TY - JOUR
T1 - Probing plasma fluorinated graphene
T2 - Via spectromicroscopy
AU - Struzzi, Claudia
AU - Scardamaglia, M
AU - Reckinger, Nicolas
AU - Sezen, H
AU - Amati, M
AU - Gregoratti, L
AU - Colomer, Jean-François
AU - Ewels, C
AU - Snyders, Rony
AU - Bittencourt, Carla
N1 - Funding Information:
This work is supported by the Belgian Fund for Scientific Research (FRS-FNRS) under the FRFC contract ‘‘CHEMO-GRAPHENE’’ (convention no. 2.4577.11). This research is also supported by a Marie Curie International Research Staff Exchange Scheme Fellowship within the 7th European Community Framework Programme ‘‘NanoCF’’ (grant agreement number: PIRSES-GA-2013-612577). CS is grateful to the ‘‘Fonds pour la Formation àla Recherche dans l’Industrie et dans l’Agriculture’’ (F.R.I.A.) for financial support. MS is FRS-FNRS post-doctoral researcher, J-FC and CB are Researcher Associates at the FRS-FNRS. We thank M. Fant for technical assistance at the Elettra synchrotron. Part of the research leading to this work also received funding from the European Union Seventh Framework Program under grant agreement No. 604391 Graphene Flagship.
Publisher Copyright:
© 2017 the Owner Societies.
Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
PY - 2017
Y1 - 2017
N2 - Plasma fluorination of graphene is studied using a combination of spectroscopy and microscopy techniques, giving insight into the yield and fluorination mechanism for functionalization of supported graphene with both CF4 and SF6 gas precursors. Ion acceleration during fluorination is used to probe the effect on grafting functionalities. Adatom clustering, which occurs with CF4 plasma treatment, is suppressed when higher kinetic energy is supplied to the ions. During SF6 plasma functionalization, the sulfur atoms tend to bond to bare copper areas instead of affecting the graphene chemistry, except when the kinetic energy of the ions is restricted. Using scanning photoelectron microscopy, with a 100 nm spatial resolution, the chemical bonding environment is evaluated in the fluorinated carbon network at selected regions and the functionalization homogeneity is controlled in individual graphene flakes.
AB - Plasma fluorination of graphene is studied using a combination of spectroscopy and microscopy techniques, giving insight into the yield and fluorination mechanism for functionalization of supported graphene with both CF4 and SF6 gas precursors. Ion acceleration during fluorination is used to probe the effect on grafting functionalities. Adatom clustering, which occurs with CF4 plasma treatment, is suppressed when higher kinetic energy is supplied to the ions. During SF6 plasma functionalization, the sulfur atoms tend to bond to bare copper areas instead of affecting the graphene chemistry, except when the kinetic energy of the ions is restricted. Using scanning photoelectron microscopy, with a 100 nm spatial resolution, the chemical bonding environment is evaluated in the fluorinated carbon network at selected regions and the functionalization homogeneity is controlled in individual graphene flakes.
UR - http://www.scopus.com/inward/record.url?scp=85036654863&partnerID=8YFLogxK
U2 - 10.1039/c7cp05305c
DO - 10.1039/c7cp05305c
M3 - Article
SN - 1463-9076
VL - 19
SP - 31418
EP - 31428
JO - Physical Chemistry Chemical Physics
JF - Physical Chemistry Chemical Physics
IS - 46
ER -