TY - JOUR
T1 - Preparation and characterization of thin organosilicon films deposited on SPR chip
AU - Szunerits, S.
AU - Abou Rich, Sami
AU - Coffinier, Y.
AU - Languille, M.-A.
AU - Supiot, P.
AU - Boukherroub, R.
PY - 2008/4/20
Y1 - 2008/4/20
N2 - The paper reports on the preparation and characterization of organosilicon thin polymer films deposited on glass slides coated with 5 nm adhesion layer of titanium and 50 nm of gold. The polymer was obtained by the decomposition of 1,1,3,3-tetramethyldisiloxane precursor (TMDSO) premixed with oxygen induced in a N plasma afterglow using remote plasma-enhanced chemical vapor deposition (PECVD) technique. The film thickness was controlled by laser interferometry and was 9 nm. The chemical stability of the gold substrate coated with the organosilicon polymer film (p-TMDSO) was studied in different acidic and basic solutions (pH 1-14). While the gold/polymer interface showed a high stability in acidic media, the film was almost completely removed in basic solutions. The resulting surfaces were characterized using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), water contact angle measurements, cyclic voltammetry, and surface plasmon resonance (SPR).
AB - The paper reports on the preparation and characterization of organosilicon thin polymer films deposited on glass slides coated with 5 nm adhesion layer of titanium and 50 nm of gold. The polymer was obtained by the decomposition of 1,1,3,3-tetramethyldisiloxane precursor (TMDSO) premixed with oxygen induced in a N plasma afterglow using remote plasma-enhanced chemical vapor deposition (PECVD) technique. The film thickness was controlled by laser interferometry and was 9 nm. The chemical stability of the gold substrate coated with the organosilicon polymer film (p-TMDSO) was studied in different acidic and basic solutions (pH 1-14). While the gold/polymer interface showed a high stability in acidic media, the film was almost completely removed in basic solutions. The resulting surfaces were characterized using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), water contact angle measurements, cyclic voltammetry, and surface plasmon resonance (SPR).
UR - http://www.scopus.com/inward/record.url?scp=40149097465&partnerID=8YFLogxK
U2 - 10.1016/j.electacta.2007.08.069
DO - 10.1016/j.electacta.2007.08.069
M3 - Article
AN - SCOPUS:40149097465
SN - 0013-4686
VL - 53
SP - 3910
EP - 3915
JO - Electrochimica Acta
JF - Electrochimica Acta
IS - 11
ER -