Physical characterization of mixed HfAlOx layers by complementary analysis techniques

H. Bender; Th. Conard; O. Richard; B. Brijs; J. Pétry; W. Vandervorst; C. Defranoux; P. Boher; N. Rochat; C. Wyon; P. Mack; J. Wolstenholme; R. Vitchev; L. Houssiau; J.-J. Pireaux; A. Bergmaier; G. Dollinger

doi:10.1016/j.mseb.2003.10.118

Physical characterization of mixed HfAlO_x layers by complementary analysis techniques

H. Bender, Th. Conard, O. Richard, B. Brijs, J. Pétry, W. Vandervorst, C. Defranoux, P. Boher, N. Rochat, C. Wyon, P. Mack, J. Wolstenholme, R. Vitchev, L. Houssiau, J.-J. Pireaux, A. Bergmaier, G. Dollinger

Namur Research Institute for Life Sciences

Résultats de recherche: Contribution à un journal/une revue › Article › Revue par des pairs

Résumé

The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.

langue originale	Anglais
Pages (de - à)	60-63
Nombre de pages	4
journal	Materials science and engineering. B, Solid-state materials for advanced technology
Volume	109
Numéro de publication	1-3
Les DOIs	https://doi.org/10.1016/j.mseb.2003.10.118
Etat de la publication	Publié - 15 juin 2004

Accès au document

10.1016/j.mseb.2003.10.118

Autres fichiers et liens

Link to publication in Scopus

Contient cette citation

Bender, H., Conard, T., Richard, O., Brijs, B., Pétry, J., Vandervorst, W., Defranoux, C., Boher, P., Rochat, N., Wyon, C., Mack, P., Wolstenholme, J., Vitchev, R., Houssiau, L., Pireaux, J.-J., Bergmaier, A., & Dollinger, G. (2004). Physical characterization of mixed HfAlO_x layers by complementary analysis techniques. Materials science and engineering. B, Solid-state materials for advanced technology, 109(1-3), 60-63. https://doi.org/10.1016/j.mseb.2003.10.118

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abstract = "The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.",

author = "H. Bender and Th. Conard and O. Richard and B. Brijs and J. P{\'e}try and W. Vandervorst and C. Defranoux and P. Boher and N. Rochat and C. Wyon and P. Mack and J. Wolstenholme and R. Vitchev and L. Houssiau and J.-J. Pireaux and A. Bergmaier and G. Dollinger",

year = "2004",

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doi = "10.1016/j.mseb.2003.10.118",

language = "English",

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Bender, H, Conard, T, Richard, O, Brijs, B, Pétry, J, Vandervorst, W, Defranoux, C, Boher, P, Rochat, N, Wyon, C, Mack, P, Wolstenholme, J, Vitchev, R, Houssiau, L , Pireaux, J-J, Bergmaier, A & Dollinger, G 2004, 'Physical characterization of mixed HfAlO_x layers by complementary analysis techniques', Materials science and engineering. B, Solid-state materials for advanced technology, VOL. 109, Numéro 1-3, p. 60-63. https://doi.org/10.1016/j.mseb.2003.10.118

TY - JOUR

T1 - Physical characterization of mixed HfAlOx layers by complementary analysis techniques

AU - Bender, H.

AU - Conard, Th.

AU - Richard, O.

AU - Brijs, B.

AU - Pétry, J.

AU - Vandervorst, W.

AU - Defranoux, C.

AU - Boher, P.

AU - Rochat, N.

AU - Wyon, C.

AU - Mack, P.

AU - Wolstenholme, J.

AU - Vitchev, R.

AU - Houssiau, L.

AU - Pireaux, J.-J.

AU - Bergmaier, A.

AU - Dollinger, G.

PY - 2004/6/15

Y1 - 2004/6/15

N2 - The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.

AB - The combined information of complementary physical analysis techniques is applied to obtain a full characterisation of the important material parameters of new high-k layers, i.e. the layer thickness, density, composition and interlayer thickness and nature, and to optimise the measurement methodologies of the different techniques.

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DO - 10.1016/j.mseb.2003.10.118

M3 - Article

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EP - 63

JO - Materials science and engineering. B, Solid-state materials for advanced technology

JF - Materials science and engineering. B, Solid-state materials for advanced technology

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