Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles

Santosh Shaw, Kyle J. Miller, Julien L. Colaux, Ludovico Cademartiri

Résultats de recherche: Contribution à un journal/une revueArticle

Résumé

We describe a lithographic approach - nanocrystal plasma polymerization-based lithography - in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist.

langue originaleAnglais
Numéro d'article031607
journalJournal of Micro/ Nanolithography, MEMS, and MOEMS
Volume15
Numéro de publication3
Les DOIs
Etat de la publicationPublié - 1 juil. 2016
Modification externeOui

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