Multilayered structure of silicon oxinitrides and oxides for radiative cooling devices

INIS

• devices 100%
• layers 100%
• oxides 100%
• silicon 100%
• radiative cooling 100%
• applications 50%
• interfaces 50%
• spectra 50%
• surfaces 50%
• stoichiometry 50%
• correlations 50%
• substrates 50%
• films 50%
• geometry 50%
• sputtering 50%

Keyphrases

• Multilayered Structure 100%
• RF Sputtering Technique 33%
• Infrared Reflectance 33%
• Interface Mode 33%
• SiOx Film 33%
• Reststrahlen 33%
• Al Substrate 33%
• Reactive RF Sputtering 33%

Material Science

• Film 100%
• Silicon 100%
• Oxide Compound 100%