Morphology of polystyrene films deposited by RF plasma

Marie Haidopoulo, Frédéric Mirabella, M Horgnies, Cedric Volcke, Paul Thiry, Pierre Rouxhet, Jean-Jacques Pireaux

Résultats de recherche: Contribution à un journal/une revueArticle

Résumé

A new plasma reactor, set up with a large planar inductively coupled source, is used for the first time to deposit a polymer coating (pPS) from a styrene monomer. This work is devoted to the relationship between external plasma parameters and substrate topography, and pPS coating morphology, which is investigated by scanning electron microscopy and atomic force microscopy. Stainless steel, gold and glass surfaces are used as substrates. It is clearly demonstrated that the film morphology can be controlled by adjustment of RF input power, pressure. The analysis performed further reveals that the pPS film's characteristics strongly depend on the substrate topography and its electrical potential during the discharge. Finally, the plasma duration also strongly influences the morphology of the films. The morphologies obtained include smooth films without any specific feature, worm-like structures, particles (nanometer- and micrometer-sized) associated along preferential directions and randomly distributed particles (micrometer-sized). The intrinsic topography of the substrate influences the film structure in the case of thin films (thickness lower than about 100 nm). Polymerization is suggested to take place at the surface in contact with the discharge rather than in the gas phase. Nucleationandgrowthstart preferentiallyonsubstrate defects such as polishing scratches.
langue originaleAnglais
Pages (de - à)227-239
Nombre de pages13
journalJournal of Microscopy
Volume228
Numéro de publication2
étatPublié - 2007

Empreinte digitale

Polystyrenes
Styrene
Atomic Force Microscopy
Stainless Steel
Polymerization
Gold
Electron Scanning Microscopy
Glass
Polymers
Gases
Pressure

Citer ceci

Haidopoulo, Marie ; Mirabella, Frédéric ; Horgnies, M ; Volcke, Cedric ; Thiry, Paul ; Rouxhet, Pierre ; Pireaux, Jean-Jacques. / Morphology of polystyrene films deposited by RF plasma. Dans: Journal of Microscopy. 2007 ; Vol 228, Numéro 2. p. 227-239.
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title = "Morphology of polystyrene films deposited by RF plasma",
abstract = "A new plasma reactor, set up with a large planar inductively coupled source, is used for the first time to deposit a polymer coating (pPS) from a styrene monomer. This work is devoted to the relationship between external plasma parameters and substrate topography, and pPS coating morphology, which is investigated by scanning electron microscopy and atomic force microscopy. Stainless steel, gold and glass surfaces are used as substrates. It is clearly demonstrated that the film morphology can be controlled by adjustment of RF input power, pressure. The analysis performed further reveals that the pPS film's characteristics strongly depend on the substrate topography and its electrical potential during the discharge. Finally, the plasma duration also strongly influences the morphology of the films. The morphologies obtained include smooth films without any specific feature, worm-like structures, particles (nanometer- and micrometer-sized) associated along preferential directions and randomly distributed particles (micrometer-sized). The intrinsic topography of the substrate influences the film structure in the case of thin films (thickness lower than about 100 nm). Polymerization is suggested to take place at the surface in contact with the discharge rather than in the gas phase. Nucleationandgrowthstart preferentiallyonsubstrate defects such as polishing scratches.",
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Haidopoulo, M, Mirabella, F, Horgnies, M, Volcke, C, Thiry, P, Rouxhet, P & Pireaux, J-J 2007, 'Morphology of polystyrene films deposited by RF plasma', Journal of Microscopy, VOL. 228, Numéro 2, p. 227-239.

Morphology of polystyrene films deposited by RF plasma. / Haidopoulo, Marie; Mirabella, Frédéric; Horgnies, M; Volcke, Cedric; Thiry, Paul; Rouxhet, Pierre; Pireaux, Jean-Jacques.

Dans: Journal of Microscopy, Vol 228, Numéro 2, 2007, p. 227-239.

Résultats de recherche: Contribution à un journal/une revueArticle

TY - JOUR

T1 - Morphology of polystyrene films deposited by RF plasma

AU - Haidopoulo, Marie

AU - Mirabella, Frédéric

AU - Horgnies, M

AU - Volcke, Cedric

AU - Thiry, Paul

AU - Rouxhet, Pierre

AU - Pireaux, Jean-Jacques

PY - 2007

Y1 - 2007

N2 - A new plasma reactor, set up with a large planar inductively coupled source, is used for the first time to deposit a polymer coating (pPS) from a styrene monomer. This work is devoted to the relationship between external plasma parameters and substrate topography, and pPS coating morphology, which is investigated by scanning electron microscopy and atomic force microscopy. Stainless steel, gold and glass surfaces are used as substrates. It is clearly demonstrated that the film morphology can be controlled by adjustment of RF input power, pressure. The analysis performed further reveals that the pPS film's characteristics strongly depend on the substrate topography and its electrical potential during the discharge. Finally, the plasma duration also strongly influences the morphology of the films. The morphologies obtained include smooth films without any specific feature, worm-like structures, particles (nanometer- and micrometer-sized) associated along preferential directions and randomly distributed particles (micrometer-sized). The intrinsic topography of the substrate influences the film structure in the case of thin films (thickness lower than about 100 nm). Polymerization is suggested to take place at the surface in contact with the discharge rather than in the gas phase. Nucleationandgrowthstart preferentiallyonsubstrate defects such as polishing scratches.

AB - A new plasma reactor, set up with a large planar inductively coupled source, is used for the first time to deposit a polymer coating (pPS) from a styrene monomer. This work is devoted to the relationship between external plasma parameters and substrate topography, and pPS coating morphology, which is investigated by scanning electron microscopy and atomic force microscopy. Stainless steel, gold and glass surfaces are used as substrates. It is clearly demonstrated that the film morphology can be controlled by adjustment of RF input power, pressure. The analysis performed further reveals that the pPS film's characteristics strongly depend on the substrate topography and its electrical potential during the discharge. Finally, the plasma duration also strongly influences the morphology of the films. The morphologies obtained include smooth films without any specific feature, worm-like structures, particles (nanometer- and micrometer-sized) associated along preferential directions and randomly distributed particles (micrometer-sized). The intrinsic topography of the substrate influences the film structure in the case of thin films (thickness lower than about 100 nm). Polymerization is suggested to take place at the surface in contact with the discharge rather than in the gas phase. Nucleationandgrowthstart preferentiallyonsubstrate defects such as polishing scratches.

KW - SEM

KW - AFM

KW - plasma

KW - polystyrene

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VL - 228

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JO - Journal of Microscopy

JF - Journal of Microscopy

SN - 0022-2720

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