Metallic source/drain for advanced MOS architectures: from material engineering to device integration

E. Dubois; G. Larrieu; N. Breil; R. Valentin; F. Danneville; D.A. Yarekha; C. Krzeminski; E Lampin; J.-M. Droulez; Nicolas Reckinger; Xiaohui Tang; A. Halimaoui; R. Rengel; E. Pascual; A. Pouydebasque; X. Wallart; SYLVIE GODEY; J. Ratajczak; A. Laszcz; J. Katcki; Jean-Pierre  Raskin; G Dambrine; A Cros; T. Skotnicki

Metallic source/drain for advanced MOS architectures: from material engineering to device integration

E. Dubois, G. Larrieu, N. Breil, R. Valentin, F. Danneville, D.A. Yarekha, C. Krzeminski, E Lampin, J.-M. Droulez, Nicolas Reckinger, Xiaohui Tang, A. Halimaoui, R. Rengel, E. Pascual, A. Pouydebasque, X. Wallart, SYLVIE GODEY, J. Ratajczak, A. Laszcz, J. KatckiJean-Pierre Raskin, G Dambrine, A Cros, T. Skotnicki

Résultats de recherche: Contribution à un événement scientifique (non publié) › Résumé

langue originale	Anglais
Etat de la publication	Publié - 2009
Evénement	SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices - Athènes, Grèce Durée: 18 sept. 2009 → …

Comité scientifique

Comité scientifique	SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices
Pays/Territoire	Grèce
La ville	Athènes
période	18/09/09 → …

Contient cette citation

Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Yarekha, D. A., Krzeminski, C., Lampin, E., Droulez, J.-M., Reckinger, N., Tang, X., Halimaoui, A., Rengel, R., Pascual, E., Pouydebasque, A., Wallart, X., GODEY, SYLVIE., Ratajczak, J., Laszcz, A., ... Skotnicki, T. (2009). Metallic source/drain for advanced MOS architectures: from material engineering to device integration. Résumé de SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Grèce.

@conference{f4ef5a98a6594a2a800562da507ca792,

title = "Metallic source/drain for advanced MOS architectures: from material engineering to device integration",

author = "E. Dubois and G. Larrieu and N. Breil and R. Valentin and F. Danneville and D.A. Yarekha and C. Krzeminski and E Lampin and J.-M. Droulez and Nicolas Reckinger and Xiaohui Tang and A. Halimaoui and R. Rengel and E. Pascual and A. Pouydebasque and X. Wallart and SYLVIE GODEY and J. Ratajczak and A. Laszcz and J. Katcki and Jean-Pierre Raskin and G Dambrine and A Cros and T. Skotnicki",

year = "2009",

language = "English",

note = "SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices ; Conference date: 18-09-2009",

}

Dubois, E, Larrieu, G, Breil, N, Valentin, R, Danneville, F, Yarekha, DA, Krzeminski, C, Lampin, E, Droulez, J-M, Reckinger, N, Tang, X, Halimaoui, A, Rengel, R, Pascual, E, Pouydebasque, A, Wallart, X, GODEY, SYLVIE, Ratajczak, J, Laszcz, A, Katcki, J, Raskin, J-P, Dambrine, G, Cros, A & Skotnicki, T 2009, 'Metallic source/drain for advanced MOS architectures: from material engineering to device integration', SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices, Athènes, Grèce, 18/09/09.

TY - CONF

T1 - Metallic source/drain for advanced MOS architectures: from material engineering to device integration

AU - Dubois, E.

AU - Larrieu, G.

AU - Breil, N.

AU - Valentin, R.

AU - Danneville, F.

AU - Yarekha, D.A.

AU - Krzeminski, C.

AU - Lampin, E

AU - Droulez, J.-M.

AU - Reckinger, Nicolas

AU - Tang, Xiaohui

AU - Halimaoui, A.

AU - Rengel, R.

AU - Pascual, E.

AU - Pouydebasque, A.

AU - Wallart, X.

AU - GODEY, SYLVIE

AU - Ratajczak, J.

AU - Laszcz, A.

AU - Katcki, J.

AU - Raskin, Jean-Pierre

AU - Dambrine, G

AU - Cros, A

AU - Skotnicki, T.

PY - 2009

Y1 - 2009

M3 - Abstract

T2 - SINANO-NANOSIL Workshop Silicon-based CMOS and Beyond-CMOS Nanodevices

Y2 - 18 September 2009

ER -