Metallic source/drain architecture for advanced MOS technology: an overview of METAMOS results

E. Dubois; G. Larrieu; N. Breil; R. Valentin; F. Danneville; D.A. Yarekha; Nicolas Reckinger; X. Tang; A. Halimaoui; R. Rengel; E. Pascual; A. Pouydebasque; X. Wallart; S. Godey; J. Ratajczak; A. Laszcz; J. Katcki; J.-P. Raskin; G. Dambrine; A. Cros; T. Skotnicki

Metallic source/drain architecture for advanced MOS technology: an overview of METAMOS results

E. Dubois, G. Larrieu, N. Breil, R. Valentin, F. Danneville, D.A. Yarekha, Nicolas Reckinger, X. Tang, A. Halimaoui, R. Rengel, E. Pascual, A. Pouydebasque, X. Wallart, S. Godey, J. Ratajczak, A. Laszcz, J. Katcki, J.-P. Raskin, G. Dambrine, A. CrosT. Skotnicki

Résultats de recherche: Contribution dans un livre/un catalogue/un rapport/dans les actes d'une conférence › Article dans les actes d'une conférence/un colloque

langue originale	Anglais
titre	8th Symposium Diagnostics & Yield Advanced Silicon Devices and Technologies for ULSI Era
Etat de la publication	Publié - 2009

Contient cette citation

Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Yarekha, D. A., Reckinger, N., Tang, X., Halimaoui, A., Rengel, R., Pascual, E., Pouydebasque, A., Wallart, X., Godey, S., Ratajczak, J., Laszcz, A., Katcki, J., Raskin, J.-P., Dambrine, G., ... Skotnicki, T. (2009). Metallic source/drain architecture for advanced MOS technology: an overview of METAMOS results. Dans 8th Symposium Diagnostics & Yield Advanced Silicon Devices and Technologies for ULSI Era

@inproceedings{b19bd8af43f64706930981300990b247,

title = "Metallic source/drain architecture for advanced MOS technology: an overview of METAMOS results",

author = "E. Dubois and G. Larrieu and N. Breil and R. Valentin and F. Danneville and D.A. Yarekha and Nicolas Reckinger and X. Tang and A. Halimaoui and R. Rengel and E. Pascual and A. Pouydebasque and X. Wallart and S. Godey and J. Ratajczak and A. Laszcz and J. Katcki and J.-P. Raskin and G. Dambrine and A. Cros and T. Skotnicki",

year = "2009",

language = "English",

booktitle = "8th Symposium Diagnostics & Yield Advanced Silicon Devices and Technologies for ULSI Era",

}

Dubois, E, Larrieu, G, Breil, N, Valentin, R, Danneville, F, Yarekha, DA, Reckinger, N, Tang, X, Halimaoui, A, Rengel, R, Pascual, E, Pouydebasque, A, Wallart, X, Godey, S, Ratajczak, J, Laszcz, A, Katcki, J, Raskin, J-P, Dambrine, G, Cros, A & Skotnicki, T 2009, Metallic source/drain architecture for advanced MOS technology: an overview of METAMOS results. Dans 8th Symposium Diagnostics & Yield Advanced Silicon Devices and Technologies for ULSI Era.

Metallic source/drain architecture for advanced MOS technology: an overview of METAMOS results. / Dubois, E.; Larrieu, G.; Breil, N. et al.
8th Symposium Diagnostics & Yield Advanced Silicon Devices and Technologies for ULSI Era. 2009.

Résultats de recherche: Contribution dans un livre/un catalogue/un rapport/dans les actes d'une conférence › Article dans les actes d'une conférence/un colloque

TY - GEN

T1 - Metallic source/drain architecture for advanced MOS technology

T2 - an overview of METAMOS results

AU - Dubois, E.

AU - Larrieu, G.

AU - Breil, N.

AU - Valentin, R.

AU - Danneville, F.

AU - Yarekha, D.A.

AU - Reckinger, Nicolas

AU - Tang, X.

AU - Halimaoui, A.

AU - Rengel, R.

AU - Pascual, E.

AU - Pouydebasque, A.

AU - Wallart, X.

AU - Godey, S.

AU - Ratajczak, J.

AU - Laszcz, A.

AU - Katcki, J.

AU - Raskin, J.-P.

AU - Dambrine, G.

AU - Cros, A.

AU - Skotnicki, T.

PY - 2009

Y1 - 2009

M3 - Conference contribution

BT - 8th Symposium Diagnostics & Yield Advanced Silicon Devices and Technologies for ULSI Era

ER -