Investigation of the growth mechanisms of a–CH_x coatings deposited by pulsed reactive magnetron sputtering

INIS

• growth 100%
• investigations 100%
• coatings 100%
• magnetrons 100%
• sputtering 100%
• scaling 60%
• dynamics 40%
• thin films 40%
• hydrogen 40%
• roughness 40%
• deposition 20%
• carbon 20%
• surfaces 20%
• hydrocarbons 20%
• hydrogenation 20%
• gases 20%
• diffusion 20%
• atmospheres 20%
• microstructure 20%
• surface properties 20%
• low pressure 20%

Keyphrases

• Pulsed Reactive Magnetron Sputtering 100%
• Microstructure Properties 33%
• Scaling Exponent 33%
• Roughness Evolution 33%
• General Growth 33%
• Reactant Gas 33%
• Lateral Growth 33%
• Clustering Structure 33%
• Hydrogen Species 33%
• Dynamic Scaling 33%
• Dynamic Scaling Theory 33%
• Anomalous Scaling 33%
• Reactive Species 33%

Material Science

• Magnetron Sputtering 100%
• Thin Films 100%
• Surface Property 50%
• Amorphous Hydrogenated Carbon 50%
• Surface Diffusion 50%