Investigation of interfaces by high resolution electron energy loss spectroscopy

Résultats de recherche: Contribution à un journal/une revueArticleRevue par des pairs

Résumé

Recent measurements performed on epitaxial layers clearly demonstrate the capability of HREELS to observe interface optical phonons in dielectric layered materials. Two examples are presented: First, the case of epitaxial CaF on Si(111) where the CaF interface phonon is detected for a whole range of CaF layer thicknesses. Discrepancies with theoretical predictions are interpreted as resulting from the residual strain in the CaF layers. The second example is a III-V semiconductor superlattice GaAs-AlGaAs in which an Al-As type interface mode is clearly identified and quantitatively interpreted by the dielectric theory.
langue originaleAnglais
Pages (de - à)373-378
Nombre de pages6
journalSurface Science
Volume189-190
Numéro de publicationC
Etat de la publicationPublié - 2 oct. 1987

Empreinte digitale

Examiner les sujets de recherche de « Investigation of interfaces by high resolution electron energy loss spectroscopy ». Ensemble, ils forment une empreinte digitale unique.

Contient cette citation