Investigation of adhesion between molybdenum and polysilazane by XPS

Dodji Amouzou; Lionel Fourdrinier; Robert Sporken

doi:10.1016/j.apsusc.2015.03.110

Investigation of adhesion between molybdenum and polysilazane by XPS

Dodji Amouzou, Lionel Fourdrinier, Robert Sporken

Résultats de recherche: Contribution à un journal/une revue › Article › Revue par des pairs

Résumé

A study is conducted to investigate the interface between polysilazane (PSZ)coatings and Mo films for understanding adhesion. Two kinds of Mo/PSZ samples are investigated and the chemical environments of their interfaces are compared. Ultra-thin Mo films are deposited on PSZ coatings to probe the interface directly by X-ray photoelectron spectroscopy (XPS) and to avoid long sputtering times in depth profiling of Mo films. The investigations reveal that the sputtered Mo films systematically adhere well to PSZ coatings. The good adhesion arises from a formation of molybdenum oxycarbonitride or molybdenum carbonitride ceramics through covalent bonding between atoms from PSZ and Mo at the interface.

langue originale	Anglais
Pages (de - à)	202-206
Nombre de pages	5
journal	Applied Surface Science
Volume	343
Les DOIs	https://doi.org/10.1016/j.apsusc.2015.03.110
Etat de la publication	Publié - 15 juil. 2015

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10.1016/j.apsusc.2015.03.110

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Pierre Louette (!!Manager), Julien Colaux (!!Manager), Alexandre Felten (!!Manager), Tijani Tabarrant (!!Operator), Frederic COME (!!Operator) & Paul-Louis Debarsy (!!Manager)
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title = "Investigation of adhesion between molybdenum and polysilazane by XPS",

abstract = "A study is conducted to investigate the interface between polysilazane (PSZ)coatings and Mo films for understanding adhesion. Two kinds of Mo/PSZ samples are investigated and the chemical environments of their interfaces are compared. Ultra-thin Mo films are deposited on PSZ coatings to probe the interface directly by X-ray photoelectron spectroscopy (XPS) and to avoid long sputtering times in depth profiling of Mo films. The investigations reveal that the sputtered Mo films systematically adhere well to PSZ coatings. The good adhesion arises from a formation of molybdenum oxycarbonitride or molybdenum carbonitride ceramics through covalent bonding between atoms from PSZ and Mo at the interface.",

author = "Dodji Amouzou and Lionel Fourdrinier and Robert Sporken",

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AU - Fourdrinier, Lionel

AU - Sporken, Robert

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Y1 - 2015/7/15

N2 - A study is conducted to investigate the interface between polysilazane (PSZ)coatings and Mo films for understanding adhesion. Two kinds of Mo/PSZ samples are investigated and the chemical environments of their interfaces are compared. Ultra-thin Mo films are deposited on PSZ coatings to probe the interface directly by X-ray photoelectron spectroscopy (XPS) and to avoid long sputtering times in depth profiling of Mo films. The investigations reveal that the sputtered Mo films systematically adhere well to PSZ coatings. The good adhesion arises from a formation of molybdenum oxycarbonitride or molybdenum carbonitride ceramics through covalent bonding between atoms from PSZ and Mo at the interface.

AB - A study is conducted to investigate the interface between polysilazane (PSZ)coatings and Mo films for understanding adhesion. Two kinds of Mo/PSZ samples are investigated and the chemical environments of their interfaces are compared. Ultra-thin Mo films are deposited on PSZ coatings to probe the interface directly by X-ray photoelectron spectroscopy (XPS) and to avoid long sputtering times in depth profiling of Mo films. The investigations reveal that the sputtered Mo films systematically adhere well to PSZ coatings. The good adhesion arises from a formation of molybdenum oxycarbonitride or molybdenum carbonitride ceramics through covalent bonding between atoms from PSZ and Mo at the interface.

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SN - 0169-4332

VL - 343

SP - 202

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JO - Applied Surface Science

JF - Applied Surface Science

ER -

Investigation of adhesion between molybdenum and polysilazane by XPS

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