Résumé
The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.
langue originale | Anglais |
---|---|
Pages (de - à) | 425-428 |
Nombre de pages | 4 |
journal | Nuclear Instruments and Methods in Physics Research B- Beam interactions with material and atoms |
Volume | 240 |
Numéro de publication | 1-2 |
Les DOIs | |
Etat de la publication | Publié - 2005 |
Empreinte digitale
Examiner les sujets de recherche de « Inter-diffusion study of rhodium and tantalum by RBS ». Ensemble, ils forment une empreinte digitale unique.Équipement
-
Synthèse, Irradiation et Analyse de Matériaux (SIAM) (2016 - ...)
Pierre Louette (!!Manager), Julien Colaux (!!Manager), Alexandre Felten (!!Manager) & Jorge Humberto Mejia Mendoza (!!Manager)
Plateforme technologique Synthese, irradiation et analyse des materiauxEquipement/installations: Plateforme technolgique