Inter-diffusion study of rhodium and tantalum by RBS

V.E. Nuttens; R.L. Hubert; F. Bodart; S. Lucas

doi:10.1016/j.nimb.2005.06.139

Inter-diffusion study of rhodium and tantalum by RBS

V.E. Nuttens, R.L. Hubert, F. Bodart, S. Lucas

Namur Research Institute for Life Sciences

Résultats de recherche: Contribution à un journal/une revue › Article › Revue par des pairs

Résumé

The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.

langue originale	Anglais
Pages (de - à)	425-428
Nombre de pages	4
journal	Nuclear Instruments and Methods in Physics Research B- Beam interactions with material and atoms
Volume	240
Numéro de publication	1-2
Les DOIs	https://doi.org/10.1016/j.nimb.2005.06.139
Etat de la publication	Publié - 2005

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10.1016/j.nimb.2005.06.139

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abstract = "The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. {\textcopyright} 2005 Elsevier B.V. All rights reserved.",

keywords = "Diffusion barrier; High temperature; Rh; RBS",

author = "V.E. Nuttens and R.L. Hubert and F. Bodart and S. Lucas",

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AU - Nuttens, V.E.

AU - Hubert, R.L.

AU - Bodart, F.

AU - Lucas, S.

N1 - Publication code : **RES. ACAD.

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Y1 - 2005

N2 - The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.

AB - The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.

KW - Diffusion barrier; High temperature; Rh; RBS

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DO - 10.1016/j.nimb.2005.06.139

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JO - Nuclear Instruments and Methods in Physical Research B

JF - Nuclear Instruments and Methods in Physical Research B

IS - 1-2

ER -

Inter-diffusion study of rhodium and tantalum by RBS

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