Inter-diffusion study of rhodium and tantalum by RBS

V.E. Nuttens, R.L. Hubert, F. Bodart, S. Lucas

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Résumé

The inter-diffusion of rhodium and tantalum has been studied with the goal of synthesizing an alloy acting as a diffusion barrier for high temperature applications. Rh/Ta sandwiched samples were annealed in vacuum at temperature ranging from 800 to 900 °C and from 1000 to 1075 °C. The diffusion profiles were obtained by RBS. They suggest the formation of two clearly different phases in each temperature range considered. © 2005 Elsevier B.V. All rights reserved.
langue originaleAnglais
Pages (de - à)425-428
Nombre de pages4
journalNuclear Instruments and Methods in Physics Research B- Beam interactions with material and atoms
Volume240
Numéro de publication1-2
Les DOIs
Etat de la publicationPublié - 2005

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