Influence of oxygen co-implantation on germanium out-diffusion and nanoclustering in SiO2/Si films

Chemistry

• Liquid Film 100%
• Diffusion 100%
• Dioxygen 100%
• Germanium 100%
• Atom 33%
• Sample 33%
• Rutherford Backscattering Spectroscopy 33%
• X-Ray Photoelectron Spectroscopy 33%
• X-Ray Diffraction 33%
• Particle Size 16%
• Ion 16%
• Saturation 16%
• Environment 16%
• Oxygen Atom 16%
• Compound Mobility 16%
• Raman Spectroscopy 16%
• Silicon Atom 16%

Medicine and Dentistry

• Silicon Dioxide 100%
• Oxygen 100%
• Germanium 100%
• X Ray Diffraction 28%
• Rutherford Backscattering Spectrometry 28%
• X Ray Photoemission Spectroscopy 28%
• Measurement 14%
• Raman Spectrometry 14%
• Nanocrystal 14%

Material Science

• X-Ray Diffraction 28%
• Film 14%
• Nanocrystals 14%
• Silicon 14%