Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Said Agouram; Guy Terwagne; Franz Bodart

Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Said Agouram, Guy Terwagne, Franz Bodart (Collaborateur)

Résultats de recherche: Contribution dans un livre/un catalogue/un rapport/dans les actes d'une conférence › Chapitre (revu par des pairs) › Revue par des pairs

langue originale	Anglais
titre	Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications
rédacteurs en chef	eBooks Bentham
Pages	133-162
Nombre de pages	30
ISBN (Electronique)	978-1-60805-157-4
Etat de la publication	Publié - 2013

Synthèse, Irradiation et Analyse de Matériaux (SIAM) (2016 - ...)
Louette, P. (!!Manager), Colaux, J. (!!Manager), Felten, A. (!!Manager), Tabarrant, T. (!!Operator), COME, F. (!!Operator) & Debarsy, P.-L. (!!Manager)
Plateforme technologique Synthese, irradiation et analyse des materiaux
Equipement/installations: Plateforme technolgique

Contient cette citation

Agouram, Said ; Terwagne, Guy ; Bodart, Franz. / Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. Editeur / eBooks Bentham. 2013. p. 133-162

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title = "Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas",

author = "Said Agouram and Guy Terwagne and Franz Bodart",

year = "2013",

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Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. / Agouram, Said; Terwagne, Guy; Bodart, Franz (Collaborateur).
Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. Ed. / eBooks Bentham. 2013. p. 133-162.

Résultats de recherche: Contribution dans un livre/un catalogue/un rapport/dans les actes d'une conférence › Chapitre (revu par des pairs) › Revue par des pairs

TY - CHAP

T1 - Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

AU - Agouram, Said

AU - Terwagne, Guy

A2 - Bodart, Franz

A2 - Bentham, eBooks

PY - 2013

Y1 - 2013

M3 - Chapter (peer-reviewed)

SN - 978-1-60805-157-1

SP - 133

EP - 162

BT - Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications

ER -

Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Équipement

Synthèse, Irradiation et Analyse de Matériaux (SIAM) (2016 - ...)

Contient cette citation