Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

Said Agouram, Guy Terwagne, Franz Bodart (Collaborateur)

Résultats de recherche: Contribution dans un livre/un catalogue/un rapport/dans les actes d'une conférenceChapitre (revu par des pairs)

langue originaleAnglais
titreMetallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications
rédacteurs en chefeBooks Bentham
Pages133-162
Nombre de pages30
ISBN (Electronique)978-1-60805-157-4
étatPublié - 2013

Citer ceci

Agouram, S., Terwagne, G., & Bodart, F. (2013). Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. Dans EB. Bentham (Ed.), Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications (p. 133-162)
Agouram, Said ; Terwagne, Guy ; Bodart, Franz. / Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. Editeur / eBooks Bentham. 2013. p. 133-162
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Agouram, S, Terwagne, G & Bodart, F 2013, Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. Dans EB Bentham (Ed.), Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. p. 133-162.

Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. / Agouram, Said; Terwagne, Guy; Bodart, Franz (Collaborateur).

Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. Ed. / eBooks Bentham. 2013. p. 133-162.

Résultats de recherche: Contribution dans un livre/un catalogue/un rapport/dans les actes d'une conférenceChapitre (revu par des pairs)

TY - CHAP

T1 - Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas

AU - Agouram, Said

AU - Terwagne, Guy

A2 - Bodart, Franz

A2 - Bentham, eBooks

PY - 2013

Y1 - 2013

M3 - Chapter (peer-reviewed)

SN - 978-1-60805-157-1

SP - 133

EP - 162

BT - Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications

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Agouram S, Terwagne G, Bodart F. Growth and Characterization of Chromium Oxynitride Thin Films Prepared Using Reactive Unbalanced Magnetron Sputtering in Presence of Air as Reactive Gas. Dans Bentham EB, Editeur, Metallic oxynitride thin films by reactive sputtering and related deposition methods: processes, properties and applications. 2013. p. 133-162