Enhanced field emission from the contact between metal and dielectric

M. S. Chung, B. G. Yoon, A. Mayer, B. L. Weiss, N. M. Miskovsky, P. H. Cutler

    Résultats de recherche: Contribution dans un livre/un catalogue/un rapport/dans les actes d'une conférenceArticle dans les actes d'une conférence/un colloque

    Résumé

    We have investigated the enhanced field emission at the contact between metal and dielectric. Such a strong enhancement of field emission has been often observed as a breakdown and is considered to be due to dielectric [1]. It seems that the enhancement of emission has two reasons [2]. One is the polarization of dielectric due to the charge on the metal. The polarization charges, in return, attract free charges on the metal toward the junction, which leads to the high surface chare density near the junction. The other is the space charges produced by the very enhanced field, in dielectric. Due to a lot of space charges, the contact barrier between metal and dielectric is thinned and lowered, which leads to the production of a detour path from metal through dielectric to vacuum. The detour path can be more preferable by the view of potential energy than the direct path from metal-vacuum. We evaluate the two effects to explain the enhancement of field emission in problem.

    langue originaleAnglais
    titreProceedings - 2010 8th International Vacuum Electron Sources Conference and Nanocarbon, IVESC 2010 and NANOcarbon 2010
    Pages21-22
    Nombre de pages2
    Les DOIs
    Etat de la publicationPublié - 2010
    Evénement8th International Vacuum Electron Sources Conference, IVESC 2010 and NANOcarbon 2010 - Nanjing, Chine
    Durée: 14 oct. 201016 oct. 2010

    Série de publications

    NomProceedings - 2010 8th International Vacuum Electron Sources Conference and Nanocarbon, IVESC 2010 and NANOcarbon 2010

    Une conférence

    Une conférence8th International Vacuum Electron Sources Conference, IVESC 2010 and NANOcarbon 2010
    Pays/TerritoireChine
    La villeNanjing
    période14/10/1016/10/10

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