Control of Radio Frequency plasma process to improve the reproducibility of silicon oxynitride thin films preparation

Deda Diatezua Manpuya, Paul Thiry, Roland Caudano

Résultats de recherche: Contribution à un journal/une revue › Article

langue originale	Français
Pages (de - à)	2099-2104
Nombre de pages	6
journal	Journal of Vacuum Science and Technology A
Volume	13
Numéro de publication	4
Etat de la publication	Publié - 1995

Contient cette citation

@article{e23493f82ab74363b5140b4ac52c8bd0,

title = "Control of Radio Frequency plasma process to improve the reproducibility of silicon oxynitride thin films preparation",

author = "{Diatezua Manpuya}, Deda and Paul Thiry and Roland Caudano",

year = "1995",

language = "Fran{\c c}ais",

volume = "13",

pages = "2099--2104",

journal = "Journal of Vacuum Science and Technology A",

publisher = "AVS Science and Technology Society",

number = "4",

}