TY - JOUR
T1 - Comparative study of the monolayers of CH3-(CH2)n-SiCl3 and CH3-(CH2)n-PO(OH)2, n = 4 and 13, adsorbed on polycrystalline titanium substrates
AU - Philippin, Grégory
AU - Delhalle, Joseph
AU - Mekhalif, Zineb
PY - 2003
Y1 - 2003
N2 - The purpose of this contribution is to compare the quality of adsorbed films of CH3-(CH2)n-SiCl3 and CH3-(CH2)n-PO(OH)2, n = 4 and 13. Mechanically polished polycrystalline titanium substrates were reacted with 10-3 M solutions of the compounds in ethanol for the n-alkanephosphonic acids and in toluene for the n-alkyltrichlorosilanes. Assessments of the films have been carried out with X-ray photoelectron spectroscopy, contact angle measurements and electrochemical impedance spectroscopy. n-alkyltrichlorosilanes form better quality monolayers than n-alkanephosphonic acids.
AB - The purpose of this contribution is to compare the quality of adsorbed films of CH3-(CH2)n-SiCl3 and CH3-(CH2)n-PO(OH)2, n = 4 and 13. Mechanically polished polycrystalline titanium substrates were reacted with 10-3 M solutions of the compounds in ethanol for the n-alkanephosphonic acids and in toluene for the n-alkyltrichlorosilanes. Assessments of the films have been carried out with X-ray photoelectron spectroscopy, contact angle measurements and electrochemical impedance spectroscopy. n-alkyltrichlorosilanes form better quality monolayers than n-alkanephosphonic acids.
KW - polycrystalline titanium
KW - n-tetradecanephosphonic acid
KW - n-tetradecyltrichlorosilane
KW - n-pentanephosphonic acid
KW - n-pentyltrichlorosilane
M3 - Article
VL - 212-213
SP - 530
EP - 536
JO - Applied Surface Science
JF - Applied Surface Science
ER -