Characterization of ultrathin SOI film and application to short channel MOSFETs

Chemistry

• Application 100%
• Liquid Film 100%
• Procedure 40%
• Aqueous Solution 40%
• Thickness 40%
• Oxidation Reaction 20%
• Rate 20%
• Atomic Force Microscopy 20%
• Mixture 20%
• Length 20%
• Silicon 20%
• Ellipsometry 20%
• Etching 20%
• Roughness 20%
• Field Effect 20%
• Compound Mobility 20%
• Semiconductor 20%
• Metal Oxide 20%
• Schottky Contact 20%
• Residual Stress 20%
• Reflectivity 20%

Engineering

• Thinning Process 100%
• Bridge Type 50%
• Residual Stress 50%
• Etch Rate 50%
• Dilute Solution 50%
• Bulk Silicon 50%
• Current Drive 50%
• Gate Length 50%

Material Science

• Film 100%
• Metal-Oxide-Semiconductor Field-Effect Transistor 100%
• Thin Films 66%
• Mixture 33%
• Bar (Metal) 33%
• Reflectivity 33%