Aluminium and silicon determination on two Si-Al sputter targets used for magnetron sputtering

    Résultats de recherche: Contribution à un journal/une revueArticleRevue par des pairs

    121 Téléchargements (Pure)


    Si–Al coatings of different stoichiometry can be produced by unbalanced magnetron sputtering. The Si–Al alloy target used for this technique are prepared by two different ways:

    • Silicon and aluminium are reduced to powder and pressed together in order to obtain a homogeneous target containing a known amount of aluminium and silicon.
    • Si–Al alloy is produced by Péchiney (Voreppe, France) and contains small silicon grains impregnated into a Si–Al alloy.

    Aluminium and silicon concentrations of such alloys were measured by Proton Induce X-ray Emission (PIXE) using the microprobe facility at LARN (Namur, Belgium). Measurements were carried out in the tracks due to material removed by sputtering when the target is used for DC-magnetron and also in the virgin zone where no material has been removed.

    The results show clearly that the relative concentrations of Al and Si are not preserved when the target is sputtered with 500 eV Ar atoms. This result can be explained by the different sputtering yields of Al and Si and the stoichiometry of the coatings are related to the composition of the target.
    langue originaleAnglais
    Pages (de - à)683-688
    Nombre de pages6
    journalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
    Les DOIs
    Etat de la publicationPublié - 1999

    Empreinte digitale

    Examiner les sujets de recherche de « Aluminium and silicon determination on two Si-Al sputter targets used for magnetron sputtering ». Ensemble, ils forment une empreinte digitale unique.

    Contient cette citation