Achieving on chip micro-supercapacitors based on CrN deposited by bipolar magnetron sputtering at glancing angle

Emile Haye, Amine Achour, Abdelouadoud Guerra, Fatsah Moulaï, Toufik Hadjersi, Rabah Boukherroub, Adriano Panepinto, Thierry Brousse, Jean Jacques Pireaux, Stephane Lucas

Résultats de recherche: Contribution à un journal/une revueArticle

Résumé

The enhancement of the surface area and ordering of mesopores is a key parameter to increase the specific capacitance of electrochemical capacitors (ECs). These parameters can improve the electrolyte accessibility to the active material in order to improve its charge storage. In this work, magnetron sputtering at glancing angle (GLAD) is used in order to enhance the porosity of CrN for use as electrode material in ECs. The GLAD technique consists on tilting the substrate according to the deposition flux allowing the formation of well-separated columns due to a ballistic shadowing effect. Four different tilts of 0°, 45°, 60° and 75° were explored. While the CrN films deposited at 0° or 75° do not show any capacitive behaviour, a high areal capacitance is obtained at 45° or 60° (35.4 mF cm−2 at a current density of 1.2 mA cm−2 in 0.5 M H2SO4 electrolyte) with a good cycling stability over 10,000 cycles. On chip interdigitated micro-supercapacitors (MSCs) were assembled with a maximum energy density of 2 μWh.cm−2 (15.3 mWh.cm−3) at a power density of 20 μW cm−2 (0.15 W cm−3). The GLAD strategy can be generalised to other materials deposited by physical vapour deposition techniques, for highly porous electrodes, with improved electrochemical energy storage properties.

langue originaleAnglais
Numéro d'article134890
Nombre de pages11
journalElectrochimica Acta
Volume324
Les DOIs
étatPublié - 20 nov. 2019

Empreinte digitale

Magnetron sputtering
Electrolytes
Capacitors
Capacitance
Electrodes
Physical vapor deposition
Ballistics
Energy storage
Current density
Porosity
Fluxes
Substrates
Supercapacitor

Citer ceci

Haye, Emile ; Achour, Amine ; Guerra, Abdelouadoud ; Moulaï, Fatsah ; Hadjersi, Toufik ; Boukherroub, Rabah ; Panepinto, Adriano ; Brousse, Thierry ; Pireaux, Jean Jacques ; Lucas, Stephane. / Achieving on chip micro-supercapacitors based on CrN deposited by bipolar magnetron sputtering at glancing angle. Dans: Electrochimica Acta. 2019 ; Vol 324.
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title = "Achieving on chip micro-supercapacitors based on CrN deposited by bipolar magnetron sputtering at glancing angle",
abstract = "The enhancement of the surface area and ordering of mesopores is a key parameter to increase the specific capacitance of electrochemical capacitors (ECs). These parameters can improve the electrolyte accessibility to the active material in order to improve its charge storage. In this work, magnetron sputtering at glancing angle (GLAD) is used in order to enhance the porosity of CrN for use as electrode material in ECs. The GLAD technique consists on tilting the substrate according to the deposition flux allowing the formation of well-separated columns due to a ballistic shadowing effect. Four different tilts of 0°, 45°, 60° and 75° were explored. While the CrN films deposited at 0° or 75° do not show any capacitive behaviour, a high areal capacitance is obtained at 45° or 60° (35.4 mF cm−2 at a current density of 1.2 mA cm−2 in 0.5 M H2SO4 electrolyte) with a good cycling stability over 10,000 cycles. On chip interdigitated micro-supercapacitors (MSCs) were assembled with a maximum energy density of 2 μWh.cm−2 (15.3 mWh.cm−3) at a power density of 20 μW cm−2 (0.15 W cm−3). The GLAD strategy can be generalised to other materials deposited by physical vapour deposition techniques, for highly porous electrodes, with improved electrochemical energy storage properties.",
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Achieving on chip micro-supercapacitors based on CrN deposited by bipolar magnetron sputtering at glancing angle. / Haye, Emile; Achour, Amine; Guerra, Abdelouadoud; Moulaï, Fatsah; Hadjersi, Toufik; Boukherroub, Rabah; Panepinto, Adriano; Brousse, Thierry; Pireaux, Jean Jacques; Lucas, Stephane.

Dans: Electrochimica Acta, Vol 324, 134890, 20.11.2019.

Résultats de recherche: Contribution à un journal/une revueArticle

TY - JOUR

T1 - Achieving on chip micro-supercapacitors based on CrN deposited by bipolar magnetron sputtering at glancing angle

AU - Haye, Emile

AU - Achour, Amine

AU - Guerra, Abdelouadoud

AU - Moulaï, Fatsah

AU - Hadjersi, Toufik

AU - Boukherroub, Rabah

AU - Panepinto, Adriano

AU - Brousse, Thierry

AU - Pireaux, Jean Jacques

AU - Lucas, Stephane

PY - 2019/11/20

Y1 - 2019/11/20

N2 - The enhancement of the surface area and ordering of mesopores is a key parameter to increase the specific capacitance of electrochemical capacitors (ECs). These parameters can improve the electrolyte accessibility to the active material in order to improve its charge storage. In this work, magnetron sputtering at glancing angle (GLAD) is used in order to enhance the porosity of CrN for use as electrode material in ECs. The GLAD technique consists on tilting the substrate according to the deposition flux allowing the formation of well-separated columns due to a ballistic shadowing effect. Four different tilts of 0°, 45°, 60° and 75° were explored. While the CrN films deposited at 0° or 75° do not show any capacitive behaviour, a high areal capacitance is obtained at 45° or 60° (35.4 mF cm−2 at a current density of 1.2 mA cm−2 in 0.5 M H2SO4 electrolyte) with a good cycling stability over 10,000 cycles. On chip interdigitated micro-supercapacitors (MSCs) were assembled with a maximum energy density of 2 μWh.cm−2 (15.3 mWh.cm−3) at a power density of 20 μW cm−2 (0.15 W cm−3). The GLAD strategy can be generalised to other materials deposited by physical vapour deposition techniques, for highly porous electrodes, with improved electrochemical energy storage properties.

AB - The enhancement of the surface area and ordering of mesopores is a key parameter to increase the specific capacitance of electrochemical capacitors (ECs). These parameters can improve the electrolyte accessibility to the active material in order to improve its charge storage. In this work, magnetron sputtering at glancing angle (GLAD) is used in order to enhance the porosity of CrN for use as electrode material in ECs. The GLAD technique consists on tilting the substrate according to the deposition flux allowing the formation of well-separated columns due to a ballistic shadowing effect. Four different tilts of 0°, 45°, 60° and 75° were explored. While the CrN films deposited at 0° or 75° do not show any capacitive behaviour, a high areal capacitance is obtained at 45° or 60° (35.4 mF cm−2 at a current density of 1.2 mA cm−2 in 0.5 M H2SO4 electrolyte) with a good cycling stability over 10,000 cycles. On chip interdigitated micro-supercapacitors (MSCs) were assembled with a maximum energy density of 2 μWh.cm−2 (15.3 mWh.cm−3) at a power density of 20 μW cm−2 (0.15 W cm−3). The GLAD strategy can be generalised to other materials deposited by physical vapour deposition techniques, for highly porous electrodes, with improved electrochemical energy storage properties.

KW - Electrochemical capacitors

KW - GLAD

KW - On chip micro-supercapacitor

KW - Transition metal nitrides

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DO - 10.1016/j.electacta.2019.134890

M3 - Article

VL - 324

JO - Electrochimica Acta

JF - Electrochimica Acta

SN - 0013-4686

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